SCHEMBL18850146

SCHEMBL18850146

O=C(O)C1CCCCC(C2CCCC(C(=O)O)C2)C1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ANPEP P15144 1/20 0.42
CES2 O00748 1/20 0.42
CES1 P23141 1/20 0.42
BTK Q06187 1/20 0.42
TSHR P16473 3/20 0.41
SLC6A1 P30531 2/20 0.41
SLC6A11 P48066 1/20 0.41
LMNA P02545 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
SLC6A13 Q9NSD5 1/20 0.41
HSD11B1 P28845 2/20 0.40
GABRR1 P24046 1/20 0.40
EPHX2 P34913 1/20 0.40
ACE P12821 1/20 0.38
GABRP O00591 1/20 0.37
GABRD O14764 1/20 0.37
GABRA1 P14867 1/20 0.37
GABRB1 P18505 1/20 0.37
GABRG2 P18507 1/20 0.37
GABRB3 P28472 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19807394 0.98 ANPEP (0.41) ANPEPCES2CES1BTKTSHR
SCHEMBL14839455 0.97 TSHR (0.43) ANPEPCES2CES1BTKTSHR
SCHEMBL24492726 0.93 CES2 (0.46) ANPEPCES2CES1BTKTSHR
SCHEMBL1073547 0.90 TSHR (0.40) CES2CES1TSHRSLC6A1SLC6A11
SCHEMBL25635425 0.90 TSHR (0.40) ANPEPBTKTSHRSLC6A1SLC6A11
SCHEMBL24312554 0.90 TSHR (0.40) ANPEPBTKTSHRSLC6A1SLC6A11
SCHEMBL16604542 0.88 ACE (0.41) ANPEPBTKTSHRSLC6A1SLC6A11
SCHEMBL11216737 0.88 ACE (0.41) ANPEPCES2CES1TSHRSLC6A1
SCHEMBL31453008 0.88 ACE (0.41) ANPEPCES2CES1TSHRSLC6A1
SCHEMBL2460791 0.88 ACE (0.41) ANPEPCES2CES1TSHRSLC6A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-10023752-B2 Conductive material and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-17 US disclosed
US-20170130070-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 US disclosed