SCHEMBL1885863

SCHEMBL1885863

CCOCCOCCOP(=O)(OCCOCCOCC)OCCOCCOCC

nearest known ligand 0.67

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.67
CYP3A4 P08684 2/20 0.67
ALDH1A1 P00352 4/20 0.42
TP53 P04637 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
THRB P10828 1/20 0.35
HPGD P15428 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
PPARD Q03181 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL872327 1.00 TSHR (0.67) TSHRCYP3A4ALDH1A1TP53TDP1
SCHEMBL6273213 0.97 TSHR (0.62) TSHRCYP3A4ALDH1A1TP53TDP1
SCHEMBL13963394 0.93 TSHR (0.65) TSHRCYP3A4ALDH1A1TP53TDP1
SCHEMBL15293621 0.93 TSHR (0.65) TSHRCYP3A4ALDH1A1TP53TDP1
Ammonia Solution, Strong SCHEMBL28386014 0.90 TSHR (0.62) TSHRCYP3A4ALDH1A1TP53TDP1
SCHEMBL117529 0.90 TSHR (0.68) TSHRCYP3A4ALDH1A1TP53TDP1
SCHEMBL15283502 0.89 TSHR (0.88) TSHRCYP3A4THRBHPGDSMN1; SMN2
SCHEMBL7556520 0.86 CYP3A4 (0.76) TSHRCYP3A4HPGDSMN1; SMN2
SCHEMBL5600582 0.85 CYP3A4 (0.61) TSHRCYP3A4ALDH1A1HPGDSMN1; SMN2
SCHEMBL5602837 0.85 CYP3A4 (0.61) TSHRCYP3A4ALDH1A1HPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8785520-B2 Process for production of polylactic acid resin composition KAO CORPORATION (JP) 2014-07-22 US claimed
EP-2653499-A1 POLYLACTIC ACID RESIN COMPOSITION Kao Corporation (JP) 2013-10-23 EP claimed
US-20130261214-A1 POLYLACTIC ACID RESIN COMPOSITION KAO CORPORATION (JP) 2013-10-03 US claimed
US-20120296017-A1 PROCESS FOR PRODUCTION OF POLYLACTIC ACID RESIN COMPOSITION KAO CORPORATION (JP) 2012-11-22 US claimed
US-20050123578-A1 Method of treating skin with a composition comprising a phosphoric triester and a skin activating component KAO CORPORATION (JP) 2005-06-09 US claimed
US-6451327-B1 GRANULATED ANIONIC, NONIONIC, AND/OR AMPHOTERIC SURFACTANTS AND BINDER IN NONAQUEOUS BASE; SENSISTIVITY; MASSAGED FEEL KAO CORPORATION (JP) 2002-09-17 US claimed
US-5972877-A MIXTURE OF A POLYOL ETHER, ANIONIC SURFACTANT AND THICKENER KAO CORPORATION (JP) 1999-10-26 US claimed
US-4140647-A ORGANIC ETHER PHOSPHATE, INORGANIC BASE, ANIONIC AND NONIONIC SURFACTANTS, WATER KAO SOAP CO., LTD. (JP) 1979-02-20 US claimed
JP-10017581-A None JP disclosed
US-11267232-B2 Decorative film, method for producing decorative film, and method for producing three-dimensional molded product provided with decorative film AGC Inc. (JP) 2022-03-08 US disclosed
EP-3656545-B1 SOLUBLE MATERIAL FOR THREE-DIMENSIONAL MOLDING KAO CORP (JP) 2021-06-23 EP disclosed
US-20210101376-A1 DECORATIVE FILM, METHOD FOR PRODUCING DECORATIVE FILM, AND METHOD FOR PRODUCING THREE-DIMENSIONAL MOLDED PRODUCT PROVIDED WITH DECORATIVE FILM AGC Inc. (JP) 2021-04-08 US disclosed
US-10954378-B2 Soluble material for three-dimensional molding KAO CORPORATION (JP) 2021-03-23 US disclosed
US-10738142-B2 Soluble material for three-dimensional molding KAO CORPORATION (JP) 2020-08-11 US disclosed
US-20020187166-A1 COSMETIC COMPOSITION COMPRISING A PHOSPHORIC TRIESTER AND A SKIN ACTIVATING COMPONENT KAO CORPORATION (JP) 2002-12-12 US disclosed
US-6451327-B1 GRANULATED ANIONIC, NONIONIC, AND/OR AMPHOTERIC SURFACTANTS AND BINDER IN NONAQUEOUS BASE; SENSISTIVITY; MASSAGED FEEL KAO CORPORATION (JP) 2002-09-17 US disclosed
EP-1016403-A2 Skin cleansing composition Kao Corporation (JP) 2000-07-05 EP disclosed
EP-0965328-A1 COSMETIC Kao Corporation (JP) 1999-12-22 EP disclosed
US-5972877-A MIXTURE OF A POLYOL ETHER, ANIONIC SURFACTANT AND THICKENER KAO CORPORATION (JP) 1999-10-26 US disclosed
JP-H1017581-A PRODUCTION OF PHOSPHORIC TRIESTER KAO CORP 1998-01-20 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050123578-A1 Method of treating skin with a composition comprising a phosphoric triester and a skin activating component CUTA, PIM1, PIM2 TSHR 1920/4885CYP3A4 3561/4885ALDH1A1 3649/4885
US-20020187166-A1 COSMETIC COMPOSITION COMPRISING A PHOSPHORIC TRIESTER AND A SKIN ACTIVATING COMPONENT CUTA, PIM1, PIM2 TSHR 2181/4885CYP3A4 3813/4885ALDH1A1 3338/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.