⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10181 | 0.89 | — | — | |
| SCHEMBL9157890 | 0.89 | LMNA (0.50) | — | |
| Hydrochloric Acid SCHEMBL6900073 | 0.85 | — | — | |
| SCHEMBL11876964 | 0.85 | — | — | |
| SCHEMBL28443181 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL180387 | 0.85 | — | — | |
| SCHEMBL16584064 | 0.85 | — | — | |
| Urea SCHEMBL1744663 | 0.85 | — | — | |
| SCHEMBL14861005 | 0.85 | — | — | |
| Ammonia Solution, Strong SCHEMBL8332852 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109752923-A | Photosensitive resin composition | 三星显示有限公司 | 2019-05-14 | — | — | CN | claimed |
| CN-1306336-C | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-03-21 | — | — | CN | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| CN-1432871-A | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2003-07-30 | — | — | CN | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| CN-116648671-A | Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index | 株式会社东进世美肯 | 2023-08-25 | — | — | CN | disclosed |
| CN-115220303-A | Photosensitive resin composition and display device comprising same | 株式会社东进世美肯 | 2022-10-21 | — | — | CN | disclosed |
| CN-109752923-A | Photosensitive resin composition | 三星显示有限公司 | 2019-05-14 | — | — | CN | disclosed |
| US-9169409-B2 | Ink composition for imprint lithography and roll printing | LG DISPLAY CO., LTD. (KR) | 2015-10-27 | — | — | US | disclosed |
| US-20150133582-A1 | INK COMPOSITION FOR IMPRINT LITHOGRAPHY AND ROLL PRINTING | LG DISPLAY CO., LTD. (KR) | 2015-05-14 | — | — | US | disclosed |
| CN-101735690-B | Ink composition and method of fabricating liquid crystal display device using same | LG DISPLAY CO LTD | 2014-05-14 | — | — | CN | disclosed |
| US-8492459-B2 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2013-07-23 | — | — | US | disclosed |
| US-20100079547-A1 | INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| US-20090176936-A1 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2009-07-09 | — | — | US | disclosed |
| CN-101457050-A | Ink combination and method for forming patterns using the ink combination | LG DISPLAY CO LTD (KR) | 2009-06-17 | — | — | CN | disclosed |
| CN-1983031-A | Photosensitive resin composition for organic light emitting diodes | DONGJIN SEMICHEM CO LTD (KR) | 2007-06-20 | — | — | CN | disclosed |
| CN-1306336-C | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-03-21 | — | — | CN | disclosed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | disclosed |
| CN-1432871-A | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2003-07-30 | — | — | CN | disclosed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | disclosed |