SCHEMBL18890896

SCHEMBL18890896

CC(C)(C)OCOc1ccc(S(=O)(=O)c2ccc(OC(=O)OC(C)(C)C)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ELANE P08246 4/20 0.50
PKM P14618 2/20 0.46
POLB P06746 1/20 0.46
MAPT P10636 1/20 0.46
ALDH1A1 P00352 2/20 0.44
GAA P10253 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
CA2 P00918 6/20 0.41
CA12 O43570 5/20 0.41
CA1 P00915 5/20 0.41
CA9 Q16790 5/20 0.41
KDM1A O60341 1/20 0.39
KMT2A Q03164 2/20 0.37
LMNA P02545 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
GPR119 Q8TDV5 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482513 0.87 ELANE (0.64) ELANEPKMPOLBMAPTALDH1A1
SCHEMBL14227006 0.81 ELANE (0.69) ELANEPKMPOLBMAPTALDH1A1
SCHEMBL19755179 0.80 ELANE (0.79) ELANEPKMPOLBMAPT
SCHEMBL24512616 0.80 ELANE (0.51) ELANEPKMPOLBMAPTALDH1A1
SCHEMBL8615079 0.78 ELANE (0.53) ELANEPKMPOLBMAPTALDH1A1
SCHEMBL9352386 0.76 ELANE (0.62) ELANEPKMPOLBMAPTCA2
SCHEMBL4061370 0.75 ELANE (0.81) ELANEMAPTCA2KDM1AKMT2A
SCHEMBL19103207 0.72 CA12 (0.41) ELANEMAPTALDH1A1GAANPSR1
SCHEMBL8319678 0.71 ELANE (0.55) ELANEPKMPOLBMAPTALDH1A1
SCHEMBL1457134 0.71 ELANE (0.68) ELANEMAPTALDH1A1NPSR1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10197917-B2 Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophore NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-02-05 US disclosed
US-20170146906-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING PHENYL GROUP-CONTAINING CHROMOPHORE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-05-25 US disclosed