Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 9/20 | 0.68 |
| ▸ | KDM1A | O60341 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | RAB9A | P51151 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.38 |
| ▸ | MAPKAPK2 | P49137 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12240212 | 1.00 | ELANE (0.68) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL14878467 | 0.95 | ELANE (0.62) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL12240209 | 0.95 | ELANE (0.62) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL5561643 | 0.95 | ELANE (0.62) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL12240208 | 0.95 | ELANE (0.62) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL22504634 | 0.93 | ELANE (0.60) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL12240210 | 0.90 | ELANE (0.57) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL12240211 | 0.90 | ELANE (0.57) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL4061370 | 0.90 | ELANE (0.81) | ELANEKDM1AMAPTRAB9ATDP1 | |
| SCHEMBL18950789 | 0.89 | ELANE (0.55) | ELANEKDM1AMAPTRAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3566098-B1 | CHEMICALLY AMPLIFIED POSITIVE TYPE PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | MERCK PATENT GMBH (DE) | 2025-11-19 | — | — | EP | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-11163233-B2 | Chemically amplified positive type photoresist composition and pattern forming method using the same | MERCK PATENT GMBH (DE) | 2021-11-02 | — | — | US | disclosed |
| US-11163233-B2 | Chemically amplified positive type photoresist composition and pattern forming method using the same | MERCK PATENT GMBH (DE) | 2021-11-02 | — | — | US | disclosed |
| US-20210055653-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-02-25 | — | — | US | disclosed |
| EP-1449833-B1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2009-09-09 | — | — | EP | disclosed |
| US-7374857-B2 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| EP-1314725-B1 | SULFONIUM SALT COMPOUND | WAKO PURE CHEM IND LTD (JP) | 2008-03-19 | — | — | EP | disclosed |
| US-6924323-B2 | Sulfonium salt compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2005-08-02 | — | — | US | disclosed |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2005-02-17 | — | — | US | disclosed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| US-6723483-B1 | Sulfonium salt compounds | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2004-04-20 | — | — | US | disclosed |
| US-20040033434-A1 | Sulfonium salt compound | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2004-02-19 | — | — | US | disclosed |
| US-6586152-B1 | Useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula useful as an ingredient of a resist composition used for | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-07-01 | — | — | US | disclosed |
| EP-1314725-A1 | SULFONIUM SALT COMPOUND | Wako Pure Chemical Industries, Ltd. (JP) | 2003-05-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | ELANE 515/4885KDM1A 1271/4885MAPT 96/4885 |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | RER1, TERB1, TRRAP | ELANE 543/4885KDM1A 1234/4885MAPT 82/4885 |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | ELANE 515/4885KDM1A 1271/4885MAPT 96/4885 |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | ASIC1, GAR1, RER1 | ELANE 4461/4885KDM1A 1005/4885MAPT 868/4885 |
| US-20040033434-A1 | Sulfonium salt compound | SPIN1, RER1, SPIN2B | ELANE 3146/4885KDM1A 562/4885MAPT 2666/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.