Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.42 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.34 |
| ▸ | CTSV | O60911 | 1/20 | 0.34 |
| ▸ | CTSL | P07711 | 1/20 | 0.34 |
| ▸ | CTSB | P07858 | 1/20 | 0.34 |
| ▸ | CTSS | P25774 | 1/20 | 0.34 |
| ▸ | CTSK | P43235 | 1/20 | 0.34 |
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.32 |
| ▸ | TAS1R2 | Q8TE23 | 1/20 | 0.32 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL824248 | 0.86 | CYP3A4 (0.43) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL13921930 | 0.85 | CYP3A4 (0.45) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL20691896 | 0.84 | CYP3A4 (0.42) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL11965874 | 0.82 | CYP3A4 (0.47) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL18897886 | 0.82 | — | — | |
| SCHEMBL18897888 | 0.79 | UGT2B7 (0.34) | — | |
| SCHEMBL3692737 | 0.77 | CYP3A4 (0.43) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL13445840 | 0.77 | CYP3A4 (0.43) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL18898007 | 0.77 | CYP3A4 (0.41) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL47528 | 0.76 | CYP3A4 (0.42) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |
| US-9740100-B2 | Hemiacetal compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9665002-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-30 | — | — | US | disclosed |