SCHEMBL18897969

SCHEMBL18897969

CCC(C)(I)C(=O)OCCC1C2CCC1C(O)(C(F)(F)F)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20820945 0.80 — —
SCHEMBL20215488 0.77 — —
SCHEMBL19808232 0.71 TSHR (0.37) —
SCHEMBL20215493 0.70 — —
SCHEMBL20215431 0.70 — —
SCHEMBL20820982 0.67 — —
SCHEMBL20820947 0.66 — —
SCHEMBL19480413 0.66 — —
SCHEMBL5613479 0.63 HCAR2 (0.36) —
SCHEMBL18897983 0.62 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9665002-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 — — US disclosed
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