SCHEMBL19480413

SCHEMBL19480413

CCC(C)(I)C(=O)OCCOC(=O)C(F)(F)S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18845146 0.81 POLB (0.31) —
SCHEMBL5613479 0.79 HCAR2 (0.36) —
SCHEMBL21574538 0.76 LMNA (0.33) —
SCHEMBL20820968 0.76 — —
SCHEMBL18898224 0.76 — —
SCHEMBL18480033 0.76 HTT (0.42) —
SCHEMBL5613175 0.76 ALDH1A1 (0.48) —
SCHEMBL5613181 0.74 CYP4F2 (0.42) —
SCHEMBL18898222 0.73 — —
SCHEMBL18772396 0.73 CHRM2 (0.47) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170299963-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-19 — — US disclosed
Send feedback