SCHEMBL18905528

SCHEMBL18905528

C/C=C(/CC)c1ccc([SiH3])cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 4/20 0.44
▸ ESR2 Q92731 3/20 0.44
▸ PTGS1 P23219 8/20 0.37
▸ PTGS2 P35354 4/20 0.35
▸ NR1I2 O75469 2/20 0.33
▸ TSHR P16473 2/20 0.33
▸ MEN1 O00255 2/20 0.33
▸ LMNA P02545 2/20 0.33
▸ NR3C1 P04150 2/20 0.33
▸ TP53 P04637 2/20 0.33
▸ CYP1A2 P05177 2/20 0.33
▸ CYP3A4 P08684 2/20 0.33
▸ ADORA3 P0DMS8 2/20 0.33
▸ CYP2D6 P10635 2/20 0.33
▸ MAPT P10636 2/20 0.33
▸ CYP2C9 P11712 2/20 0.33
▸ ALOX15 P16050 2/20 0.33
▸ CYP2C19 P33261 2/20 0.33
▸ OPRD1 P41143 2/20 0.33
▸ KMT2A Q03164 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19159318 0.79 ESR1 (0.45) ESR1ESR2PTGS1MEN1LMNA
SCHEMBL10581272 0.79 ESR1 (0.67) ESR1ESR2PTGS1PTGS2NR1I2
SCHEMBL6264609 0.79 ESR1 (0.67) ESR1ESR2PTGS1PTGS2NR1I2
SCHEMBL14553634 0.78 HTT (0.45) ESR1ESR2PTGS1MEN1LMNA
SCHEMBL23145325 0.77 HTT (0.44) ESR1ESR2PTGS1LMNACYP1A2
SCHEMBL2082470 0.77 ESR1 (0.44) ESR1ESR2PTGS1PTGS2MEN1
SCHEMBL23145323 0.77 HTT (0.44) ESR1ESR2PTGS1LMNACYP1A2
SCHEMBL14553635 0.77 ALDH1A1 (0.50) ESR1ESR2PTGS1TP53CYP2C9
SCHEMBL23145395 0.77 HTT (0.44) ESR1ESR2PTGS1LMNACYP1A2
SCHEMBL2082467 0.77 ESR1 (0.44) ESR1ESR2PTGS1PTGS2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 — — US disclosed
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