SCHEMBL18912866

SCHEMBL18912866

COC1CC2CC[C@H]1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13006650 1.00
SCHEMBL13006656 1.00
SCHEMBL4200480 1.00
SCHEMBL14492515 1.00
SCHEMBL14274192 0.86 ATM (0.31)
SCHEMBL26498564 0.86 ATM (0.31)
SCHEMBL96493 0.85 ATM (0.32)
SCHEMBL96309 0.84 ATM (0.33)
SCHEMBL15291257 0.84
SCHEMBL21134909 0.83 APLNR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170153549-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-06-01 US disclosed