Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACLY | P53396 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | ACACB | O00763 | 1/20 | 0.31 |
| ▸ | ACACA | Q13085 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL93263 | 0.74 | TDP1 (0.48) | TDP1 | |
| SCHEMBL8742918 | 0.74 | ACLY (0.37) | ACLYTDP1ACACBACACA | |
| SCHEMBL2953323 | 0.73 | HMGCR (0.44) | TDP1TSHRALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL797973 | 0.72 | TSHR (0.47) | ACLYTDP1TSHRALDH1A1ACACB | |
| SCHEMBL8744252 | 0.72 | ACLY (0.43) | ACLYTDP1TSHRACACBACACA | |
| SCHEMBL16542606 | 0.72 | ACLY (0.40) | ACLYTSHRALDH1A1ACACBACACA | |
| SCHEMBL17001186 | 0.71 | — | — | |
| SCHEMBL8742300 | 0.71 | ACLY (0.39) | ACLYTDP1TSHRACACBACACA | |
| SCHEMBL18998936 | 0.71 | ACLY (0.46) | ACLYTDP1TSHRACACBACACA | |
| SCHEMBL12092642 | 0.71 | ACACB (0.62) | ACLYTDP1TSHRACACBACACA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9791776-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-17 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |