⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23343954 | 0.98 | — | — | |
| SCHEMBL13399293 | 0.73 | APP (0.31) | — | |
| SCHEMBL18431953 | 0.71 | — | — | |
| SCHEMBL23513501 | 0.71 | — | — | |
| SCHEMBL14491829 | 0.66 | INPP5A (0.34) | — | |
| SCHEMBL18775645 | 0.66 | CYP1A2 (0.38) | — | |
| SCHEMBL8250775 | 0.65 | APP (0.35) | — | |
| SCHEMBL9944395 | 0.64 | — | — | |
| SCHEMBL2288147 | 0.63 | APP (0.61) | — | |
| SCHEMBL14491825 | 0.62 | CYP1A2 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-20220121117-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-9671690-B2 | Resist composition, method for forming resist pattern, photo-reactive quencher and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-06 | — | — | US | disclosed |