SCHEMBL1893230

SCHEMBL1893230

C=CC1(C=C)CCC[Si](C=C)(C=C)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL705737 0.74
SCHEMBL705739 0.74
SCHEMBL7611245 0.64
SCHEMBL335956 0.64
SCHEMBL28935347 0.63
SCHEMBL217873 0.63
SCHEMBL2541392 0.63
SCHEMBL9717869 0.63
SCHEMBL17652500 0.59
SCHEMBL285205 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116120753-A Easily-ceramic flame-retardant silicone rubber and preparation method and application thereof 中科院广州化学有限公司 2023-05-16 CN disclosed
CN-113991178-A Non-aqueous electrolyte of lithium ion battery and application thereof 远景动力技术(江苏)有限公司 2022-01-28 CN disclosed
EP-1731549-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2013-07-03 EP disclosed
US-7947361-B2 Release film and process for producing the film LINTEC CORPORATION (JP) 2011-05-24 US disclosed
US-20080051517-A1 Curable Composition KANEKA CORPORATION 2008-02-28 US disclosed
US-20070178320-A1 Release film and process for producing the film LINTEC CORPORATION (JP) 2007-08-02 US disclosed
US-20070166523-A1 Release film and process for producing the film LINTEC CORPORATION (JP) 2007-07-19 US disclosed
EP-1731549-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2006-12-13 EP disclosed
US-6709715-B1 DEPOSITING DIELECTRIC LAYER; USING SUCH AS TETRAVINYL-TETRAMETHYLCYCLOTETRASILOXANE, TETRAALLYLOXYSILANE OR TRIVINYLMETHYLSILANE APPLIED MATERIALS INC. 2004-03-23 US disclosed
US-6362115-B1 DISSOCIATING 1,4-BIS(FORMATOMETHYL)BENZENE OR 1,4-BIS(N-METHYLAMINOMETHYL) BENZENE, CONDENSING P-XYLYLENE TO FORM A POLYMERIZED THIN POLYMER OR COPOLYMER LAYER; LOW DIELECTRIC CONSTANTS; SEMICONDUCTORS APPLIED MATERIALS, INC. 2002-03-26 US disclosed