⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217873 | 0.78 | — | — | |
| SCHEMBL4162739 | 0.75 | — | — | |
| SCHEMBL3481409 | 0.68 | — | — | |
| SCHEMBL1893230 | 0.64 | — | — | |
| SCHEMBL16247094 | 0.62 | — | — | |
| SCHEMBL705737 | 0.60 | — | — | |
| SCHEMBL6266742 | 0.59 | — | — | |
| SCHEMBL1240092 | 0.59 | — | — | |
| SCHEMBL3482459 | 0.57 | — | — | |
| SCHEMBL5067803 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 510 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260131356-A1 | POLYMER FILM USING CHEMICAL VAPOR DEPOSITION USING SULFUR AS INITIATOR (SCVD), METHOD OF PREPARING THE SAME AND APPARATUS FOR PREPARING THE SAME | KOREA ADVANCED INST OF SCIENCE AND TECHNOLOGY (KR) | 2026-05-14 | — | — | US | claimed |
| EP-4735933-A2 | SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF | Gvd Corporation (US) | 2026-05-06 | — | — | EP | claimed |
| EP-4721171-A1 | SOLID ELECTROLYTE CROSSLINKED WITH A VINYL SILOXANE CROSSLINKING AGENT | IFP Energies nouvelles (FR) | 2026-04-08 | — | — | EP | claimed |
| US-12521756-B2 | Protective coating | HZO, INC. | 2026-01-13 | — | — | US | claimed |
| EP-4450549-B1 | ENCAPSULANT FILM COMPOSITION AND ENCAPSULANT FILM COMPRISING SAME | LG CHEMICAL LTD (KR) | 2025-12-10 | — | — | EP | claimed |
| WO-2025106343-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| WO-2025033645-A1 | SEPARATOR FOR SECONDARY BATTERY COMPRISING POLYMER PROTECTIVE LAYER AND MANUFACTURING METHOD THEREFOR | (주) 딥스마텍 | 2025-02-13 | — | — | WO | claimed |
| WO-2025033646-A1 | NEGATIVE ELECTRODE MATERIAL FOR SECONDARY BATTERY COMPRISING POLYMER PROTECTIVE LAYER AND METHOD FOR PREPARING SAME | (주) 딥스마텍 | 2025-02-13 | — | — | WO | claimed |
| CN-119410332-A | High-compression rebound organosilicon sealant and preparation method thereof | 烟台德邦科技股份有限公司 | 2025-02-11 | — | — | CN | claimed |
| WO-2003005429-A1 | METHOD FOR PREPARING LOW DIELECTRIC FILMS | POSTECH FOUNDATION (KR) | 2003-01-16 | — | — | WO | claimed |
| US-6432137-B1 | EYE PROSTHETIC INSERTS | MEDENNIUM, INC. | 2002-08-13 | — | — | US | claimed |
| US-20020074086-A1 | Adhesive composition and optical device using the same | NIPPON SHEET GLASS CO., LTD. (JP) | 2002-06-20 | — | — | US | claimed |
| EP-1210133-A1 | HIGH REFRACTIVE INDEX SILICONE FOR USE IN INTRAOCULAR LENSES | Medennium, Inc. (US) | 2002-06-05 | — | — | EP | claimed |
| WO-2001017570-A1 | HIGH REFRACTIVE INDEX SILICONE FOR USE IN INTRAOCULAR LENSES | MEDENNIUM, INC. (US) | 2001-03-15 | — | — | WO | claimed |
| US-6136874-A | Microporous polymeric foams made with silicon or germanium based monomers | THE PROCTER & GAMBLE COMPANY (US) | 2000-10-24 | — | — | US | claimed |
| EP-0768860-A2 | DENTAL IMPRESSION MATERIAL WITH CURE-INDICATING DYE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-04-23 | — | — | EP | claimed |
| US-5596025-A | POLYSILOXANE CURABLE BY HYDROSILATION REACTION, COLOR CHANGE ON CURING | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-01-21 | — | — | US | claimed |
| WO-1996000560-A2 | DENTAL IMPRESSION MATERIAL WITH CURE-INDICATING DYE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-01-11 | — | — | WO | claimed |
| US-5214074-A | Unsaturated compound for controlling curing reaction such that it takes place at the same rate as decomposition of foaming agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-05-25 | — | — | US | claimed |