⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7114755 | 0.83 | — | — | |
| SCHEMBL4317507 | 0.79 | — | — | |
| SCHEMBL18940533 | 0.74 | — | — | |
| SCHEMBL14150286 | 0.70 | — | — | |
| SCHEMBL29082618 | 0.68 | — | — | |
| SCHEMBL1667024 | 0.68 | — | — | |
| SCHEMBL1619993 | 0.67 | TSHR (0.35) | — | |
| SCHEMBL3754675 | 0.67 | — | — | |
| SCHEMBL27724803 | 0.67 | — | — | |
| SCHEMBL1416105 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106662820-B | Composition for forming silicon-containing resist underlayer film having halosulfonylalkyl group | 日产化学工业株式会社 | 2021-06-22 | — | — | CN | disclosed |
| US-11022884-B2 | Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20170168397-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING HALOGENATED SULFONYLALKYL GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-06-15 | — | — | US | disclosed |
| CN-106662820-A | Silicon-containing resist underlayer film forming composition having halogenated sulfonylalkyl group | 日产化学工业株式会社 | 2017-05-10 | — | — | CN | disclosed |