Urea

Urea

SCHEMBL1894432

C=CCOCC=C.NC(N)=O

nearest known ligand 0.43

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.43
CACNA1B Q00975 1/20 0.43
APBA1 Q02410 1/20 0.43
ALDH1A1 P00352 7/20 0.40
TSHR P16473 5/20 0.40
FGFR4 P22455 1/20 0.40
CA1 P00915 3/20 0.39
CA2 P00918 3/20 0.39
CA7 P43166 2/20 0.39
CYP3A4 P08684 1/20 0.37
CA9 Q16790 2/20 0.36
TDP1 Q9NUW8 2/20 0.35
HSD17B10 Q99714 2/20 0.35
LMNA P02545 1/20 0.35
OR51E2 Q9H255 1/20 0.35
MEN1 O00255 1/20 0.34
POLB P06746 1/20 0.34
KMT2A Q03164 1/20 0.34
TP53 P04637 2/20 0.33
HIF1A Q16665 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Urea SCHEMBL22129980 0.97 MAPT (0.42) MAPTCACNA1BAPBA1ALDH1A1TSHR
Carbamic Acid SCHEMBL28274511 0.92 MAPT (0.42) MAPTCACNA1BAPBA1ALDH1A1TSHR
Acrylamide SCHEMBL10412505 0.89 ALDH1A1 (0.58) MAPTCACNA1BAPBA1ALDH1A1TSHR
Bicarbonate SCHEMBL1206563 0.85 CA1 (0.41) MAPTCACNA1BAPBA1ALDH1A1TSHR
SCHEMBL28198218 0.85 MAPT (0.47) MAPTCACNA1BAPBA1ALDH1A1TSHR
Hydroxyamine SCHEMBL7152009 0.84
SCHEMBL11216980 0.83 TDP1 (0.55) MAPTCACNA1BAPBA1ALDH1A1TSHR
Oxalic Acid SCHEMBL28528613 0.82 CA1 (0.39) MAPTCACNA1BAPBA1ALDH1A1TSHR
Acetone SCHEMBL28037702 0.82 ALDH1A1 (0.40) MAPTCACNA1BAPBA1ALDH1A1TSHR
SCHEMBL7049695 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103917916-B Organic Light Emitting Diode polyimides photosensitive polymer combination 东进世美肯株式会社 2017-11-07 CN claimed
US-6686120-B2 THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-02-03 US claimed
US-20030134222-A1 Photoresist composition and method of forming pattern using the same SAMSUNG ELECTRONICS CO., LTD. 2003-07-17 US claimed
CN-115220303-A Photosensitive resin composition and display device comprising same 株式会社东进世美肯 2022-10-21 CN disclosed
US-9169409-B2 Ink composition for imprint lithography and roll printing LG DISPLAY CO., LTD. (KR) 2015-10-27 US disclosed
US-20150133582-A1 INK COMPOSITION FOR IMPRINT LITHOGRAPHY AND ROLL PRINTING LG DISPLAY CO., LTD. (KR) 2015-05-14 US disclosed
US-8492459-B2 Ink composition and method of forming a pattern using the same LG DISPLAY CO., LTD. (KR) 2013-07-23 US disclosed
US-8226209-B2 Inkjet printhead and method of manufacturing the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-07-24 US disclosed
US-20110224335-A1 INK COMPOSITION AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME KIM SUNG-HEE 2011-09-15 US disclosed
US-7935552-B2 Ink composition and method of fabricating liquid crystal display device using the same LG DISPLAY CO., LTD. (KR) 2011-05-03 US disclosed
US-20100120181-A1 INK COMPOSITION AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME LG DISPLAY CO., LTD. (KR) 2010-05-13 US disclosed
US-20100079547-A1 INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-04-01 US disclosed
US-20090176936-A1 Ink composition and method of forming a pattern using the same LG DISPLAY CO., LTD. (KR) 2009-07-09 US disclosed
US-6686120-B2 THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-02-03 US disclosed
US-20030134222-A1 Photoresist composition and method of forming pattern using the same SAMSUNG ELECTRONICS CO., LTD. 2003-07-17 US disclosed