⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL694328 | 0.80 | — | — | |
| SCHEMBL873544 | 0.80 | — | — | |
| SCHEMBL873545 | 0.78 | — | — | |
| SCHEMBL28198217 | 0.76 | MAPT (0.46) | — | |
| SCHEMBL9442160 | 0.76 | MAPT (0.37) | — | |
| SCHEMBL2185277 | 0.76 | MAPT (0.37) | — | |
| SCHEMBL10920825 | 0.75 | — | — | |
| SCHEMBL6111499 | 0.75 | — | — | |
| SCHEMBL28510539 | 0.75 | — | — | |
| SCHEMBL1100509 | 0.73 | MAPT (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103917916-B | Organic Light Emitting Diode polyimides photosensitive polymer combination | 东进世美肯株式会社 | 2017-11-07 | — | — | CN | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| CN-115220303-A | Photosensitive resin composition and display device comprising same | 株式会社东进世美肯 | 2022-10-21 | — | — | CN | disclosed |
| US-9169409-B2 | Ink composition for imprint lithography and roll printing | LG DISPLAY CO., LTD. (KR) | 2015-10-27 | — | — | US | disclosed |
| US-20150133582-A1 | INK COMPOSITION FOR IMPRINT LITHOGRAPHY AND ROLL PRINTING | LG DISPLAY CO., LTD. (KR) | 2015-05-14 | — | — | US | disclosed |
| US-8492459-B2 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2013-07-23 | — | — | US | disclosed |
| EP-2591673-A1 | PEST CONTROL AGENT | Meiji Seika Pharma Co., Ltd. (JP) | 2013-05-15 | — | — | EP | disclosed |
| US-8226209-B2 | Inkjet printhead and method of manufacturing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-07-24 | — | — | US | disclosed |
| US-20110224335-A1 | INK COMPOSITION AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME | KIM SUNG-HEE | 2011-09-15 | — | — | US | disclosed |
| US-7935552-B2 | Ink composition and method of fabricating liquid crystal display device using the same | LG DISPLAY CO., LTD. (KR) | 2011-05-03 | — | — | US | disclosed |
| US-20100120181-A1 | INK COMPOSITION AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME | LG DISPLAY CO., LTD. (KR) | 2010-05-13 | — | — | US | disclosed |
| US-20100079547-A1 | INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| US-20090176936-A1 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2009-07-09 | — | — | US | disclosed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | disclosed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | disclosed |