SCHEMBL1898541

SCHEMBL1898541

CCCCC(CC)COOC(=O)O

nearest known ligand 0.54

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 5/20 0.54
TSHR P16473 3/20 0.54
TDP1 Q9NUW8 2/20 0.54
ATM Q13315 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.50
ALDH1A1 P00352 6/20 0.47
CA2 P00918 4/20 0.47
RECQL P46063 1/20 0.45
LMNA P02545 3/20 0.43
MMP9 P14780 1/20 0.43
MMP8 P22894 1/20 0.43
MMP14 P50281 1/20 0.43
MAPK1 P28482 3/20 0.42
HSD17B10 Q99714 1/20 0.42
PRSS1 P07477 1/20 0.42
PRSS2 P07478 1/20 0.42
PRSS3 P35030 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1408197 0.89 CYP3A4 (0.51) CYP3A4TSHRTDP1ATML3MBTL1
SCHEMBL1563876 0.87 CYP3A4 (0.56) CYP3A4TSHRTDP1ATML3MBTL1
Bicarbonate SCHEMBL5705252 0.86 CYP3A4 (0.59) CYP3A4TSHRTDP1ATML3MBTL1
Bicarbonate SCHEMBL687626 0.86 CYP3A4 (0.59) CYP3A4TSHRTDP1ATML3MBTL1
SCHEMBL11267201 0.85 CYP3A4 (0.54) CYP3A4TSHRTDP1ATML3MBTL1
SCHEMBL9663040 0.85 CYP3A4 (0.54) CYP3A4TSHRTDP1ATML3MBTL1
SCHEMBL4830712 0.82 CYP3A4 (0.51) CYP3A4TSHRTDP1ATML3MBTL1
SCHEMBL584511 0.82 CYP3A4 (0.60) CYP3A4TSHRTDP1ATML3MBTL1
SCHEMBL30589909 0.82 CYP3A4 (0.65) CYP3A4TSHRTDP1ATML3MBTL1
SCHEMBL29223395 0.82 CYP3A4 (0.60) CYP3A4TSHRTDP1ATML3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105619980-B A kind of crystalline silicon photovoltaic module encapsulation wet backboard of high insulation resistance 杭州福斯特应用材料股份有限公司 2017-09-29 CN claimed
WO-2006088561-A2 METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PEROXIDE-BASED PROCESS CHEMISTRY TOKYO ELECTRON LIMITED (JP) 2006-08-24 WO claimed
US-20060102590-A1 METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PREOXIDE-BASED PROCESS CHEMISTRY TOKYO ELECTRON LIMITED (JP) 2006-05-18 US claimed
CN-116507680-B Free radically polymerizable crosslinking agent, curable composition, and adhesive therefrom 3M创新有限公司 2024-05-14 CN disclosed
CN-117715948-A Compositions comprising monomers having carboxylic acid groups, monomers having hydroxyl groups, alkyl monomers, and crosslinkers, and related articles and methods 3M创新有限公司 2024-03-15 CN disclosed
CN-114008092-B Cross-linking agent and curable composition comprising same 3M创新有限公司 2024-02-02 CN disclosed
CN-116981705-A Compositions comprising acrylic monomers having carboxylic acid groups, acrylic monomers having hydroxyl groups, alkyl (meth) acrylate monomers, and cross-linking agents, and related articles and methods 3M创新有限公司 2023-10-31 CN disclosed
CN-116648488-A Compositions comprising a monomer having a carboxylic acid group, a monomer having a hydroxyl group, a cycloalkyl monomer, and a crosslinker, and related articles and methods 3M创新有限公司 2023-08-25 CN disclosed
CN-116635452-A Free radically polymerizable crosslinking agent, curable composition, and adhesive therefrom 3M创新有限公司 2023-08-22 CN disclosed
CN-116507680-A Free radically polymerizable crosslinking agent, curable composition, and adhesive therefrom 3M创新有限公司 2023-07-28 CN disclosed
CN-116194541-A (meth) acrylate structural adhesives and methods 3M创新有限公司 2023-05-30 CN disclosed
US-20060180174-A1 METHOD AND SYSTEM FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PEROXIDE-BASED PROCESS CHEMISTRY IN CONJUNCTION WITH AN INITIATOR TOKYO ELECTRON LIMITED (JP) 2006-08-17 US disclosed
US-20060102590-A1 METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PREOXIDE-BASED PROCESS CHEMISTRY TOKYO ELECTRON LIMITED (JP) 2006-05-18 US disclosed
EP-1044228-B1 PROCESS FOR FORMING POLY(ALLYL CARBONATE)-FUNCTIONAL PREPOLYMER COMPOSITION PPG IND OHIO INC (US) 2002-07-10 EP disclosed
US-RE37597-E1 Golf ball covers ACUSHNET COMPANY 2002-03-19 US disclosed
CN-1274732-A Process for preparation of rubber phase volume fraction raised elastomer modified polymer composition ELF ATOCHEM NORTH AMERICAN INC (US) 2000-11-29 CN disclosed
US-6057411-A HEATING ALLYL CARBONATE WITH FREE RADICAL INITIATOR FOR POLYMERIZATION PPG INDUSTRIES OHIO, INC. (US) 2000-05-02 US disclosed
EP-0182079-B1 THERMALLY STABLE ADHESIVE National Starch and Chemical Investment Holding Corporation (US) 1992-04-22 EP disclosed
US-4777230-A HIGH SOLID COATINGS PENNWALT CORPORATION (US) 1988-10-11 US disclosed
US-4604230-A BLEND OF A POLYIMIDE, TACKIFIER, EPOXY RESIN, HARDENER, CATALYST, AND CROSSLINKING AGENT STAUFFER CHEMICAL COMPANY (US) 1986-08-05 US disclosed