SCHEMBL1899110

SCHEMBL1899110

CC(NCCN)C(C)(C)N(C)C.[Cu]

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15025 0.98 CYP2C9 (0.32) CYP2C9CYP2C19
Ammonia Solution, Strong SCHEMBL15633005 0.96 CYP2C9 (0.31) CYP2C9CYP2C19
Bromide SCHEMBL28432046 0.96 CYP2C9 (0.31) CYP2C9CYP2C19
Hydrochloric Acid SCHEMBL28917497 0.96 CYP2C9 (0.31) CYP2C9CYP2C19
SCHEMBL28242935 0.96 CYP2C9 (0.31) CYP2C9CYP2C19
SCHEMBL1896553 0.96 CYP2C9 (0.31) CYP2C9CYP2C19
SCHEMBL4509964 0.92
SCHEMBL9720257 0.92 CYP2C9 (0.33) CYP2C9CYP2C19
Octane SCHEMBL7700946 0.87 DNM1 (0.35) CYP2C9CYP2C19
SCHEMBL6737631 0.87 CYP2C9 (0.42) CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11986597-B2 Nitric oxide generating systems for inhalation NOTA Laboratories, LLC (US) 2024-05-21 US disclosed
US-20210178106-A1 NITRIC OXIDE GENERATING SYSTEMS FOR INHALATION NOTA Laboratories, LLC 2021-06-17 US disclosed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed