Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.33 |
| ▸ | TP53 | P04637 | 3/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15825254 | 0.79 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL18691968 | 0.79 | — | — | |
| SCHEMBL21612735 | 0.79 | TSHR (0.35) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL2744277 | 0.78 | TSHR (0.34) | TSHR | |
| SCHEMBL13028470 | 0.77 | TSHR (0.43) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL15825971 | 0.77 | TSHR (0.39) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL138778 | 0.75 | — | — | |
| SCHEMBL10592974 | 0.75 | TSHR (0.39) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL26827372 | 0.75 | TSHR (0.43) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL2403494 | 0.75 | TSHR (0.43) | TSHRALDH1A1TP53HIF1ACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4001345-B1 | DEGRADABLE HYPERBRANCHED RESIN, PREPARATION METHOD THEREFOR, AND USE THEREOF | UNIV SOUTH CHINA TECH (CN) | 2026-04-01 | — | — | EP | claimed |
| CN-111534186-B | Fluorescent visual fluorine-silicon electronic protective coating and preparation method thereof | 浙江大学 | 2021-04-23 | — | — | CN | claimed |
| CN-110511328-B | Branched-point-breaking type hyperbranched resin and preparation method and application thereof | 华南理工大学 | 2020-11-24 | — | — | CN | claimed |
| CN-111534186-A | Fluorescent visual fluorine-silicon electronic protective coating and preparation method thereof | 浙江大学 | 2020-08-14 | — | — | CN | claimed |
| CN-110540652-B | Degradable hyperbranched resin and preparation method and application thereof | 华南理工大学 | 2020-07-28 | — | — | CN | claimed |
| CN-110540652-A | degradable hyperbranched resin and preparation method and application thereof | UNIV SOUTH CHINA TECH | 2019-12-06 | — | — | CN | claimed |
| US-12497518-B2 | Resin-coated metal powder, method for producing same and aqueous coating composition using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-16 | — | — | US | disclosed |
| US-20240052172-A1 | RESIN-COATED METAL POWDER, METHOD FOR PRODUCING SAME AND AQUEOUS COATING COMPOSITION USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-15 | — | — | US | disclosed |
| EP-4046729-A1 | RESIN-COATED METAL POWDER, METHOD FOR PRODUCING SAME AND AQUEOUS COATING COMPOSITION USING SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-08-24 | — | — | EP | disclosed |
| CN-111187548-B | Fluorosilicone composite photocatalytic antibacterial antifouling paint and preparation method thereof | 浙江大学衢州研究院 | 2021-11-30 | — | — | CN | disclosed |
| CN-111187530-B | Fluorine-silicon composite visible light catalytic antibacterial antifouling paint and preparation method thereof | 浙江大学衢州研究院 | 2021-11-26 | — | — | CN | disclosed |
| CN-111534186-B | Fluorescent visual fluorine-silicon electronic protective coating and preparation method thereof | 浙江大学 | 2021-04-23 | — | — | CN | disclosed |
| WO-2021075457-A1 | RESIN-COATED METAL POWDER, METHOD FOR PRODUCING SAME AND AQUEOUS COATING COMPOSITION USING SAME | 信越化学工業株式会社 | 2021-04-22 | — | — | WO | disclosed |
| EP-0410606-B1 | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO LTD (JP) | 1996-11-13 | — | — | EP | disclosed |
| US-5338640-A | Alkali-developable; resistance to oxygen etching; multilayer photoresists; photolithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-16 | — | — | US | disclosed |
| US-5278273-A | Additional polymer | FUJI PHOTO FILM CO., LTD. (JP) | 1994-01-11 | — | — | US | disclosed |
| US-5276124-A | Ladder polymers, photoresists, lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1994-01-04 | — | — | US | disclosed |
| US-5252686-A | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-12 | — | — | US | disclosed |
| US-5216105-A | SILICONE POLYMERS AND POSITIVE WORKING LIGHT-SENSITIVE COMPOSITIONS COMPRISING THE SAME | FUJI PHOTO FILM CO., LTD. (JP) | 1993-06-01 | — | — | US | disclosed |
| EP-0410606-A2 | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-30 | — | — | EP | disclosed |