SCHEMBL18998196

SCHEMBL18998196

F/C(=C/I)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18984851 1.00
SCHEMBL31471506 0.71
SCHEMBL22117329 0.71
SCHEMBL16812272 0.69
SCHEMBL269459 0.67
SCHEMBL269458 0.67
SCHEMBL727217 0.67
SCHEMBL727216 0.67
SCHEMBL2495659 0.67
SCHEMBL19629125 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200203174-A1 IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES AIR LIQUIDE AMERICAN (US) 2020-06-25 US disclosed
US-10607850-B2 Iodine-containing compounds for etching semiconductor structures AMERICAN AIR LIQUIDE, INC. (US) 2020-03-31 US disclosed
US-20170178923-A1 IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES AMERICAN AIR LIQUIDE, INC. 2017-06-22 US disclosed
US-20170178923-A1 IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES AMERICAN AIR LIQUIDE, INC. 2017-06-22 US disclosed