SCHEMBL19019137

SCHEMBL19019137

O=C(F)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.50
CA2 P00918 4/20 0.50
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
CA7 P43166 1/20 0.32
CA13 Q8N1Q1 1/20 0.32
EPHX1 P07099 1/20 0.31
MMP1 P03956 2/20 0.31
MMP2 P08253 2/20 0.31
MMP9 P14780 2/20 0.31
MMP8 P22894 2/20 0.31
MMP13 P45452 2/20 0.31
ALDH1A1 P00352 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
PTPN1 P18031 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10789031 0.80 CA2 (0.52) CA1CA2MAPK1SMN1; SMN2CA7
SCHEMBL25708327 0.80 CA2 (0.52) CA1CA2MAPK1SMN1; SMN2CA7
SCHEMBL19810864 0.78 CA1 (0.50) CA1CA2MAPK1SMN1; SMN2CA7
SCHEMBL319638 0.76 CA2 (0.48) CA1CA2MAPK1SMN1; SMN2CA7
SCHEMBL1618240 0.76 CA2 (0.48) CA1CA2MAPK1SMN1; SMN2CA7
SCHEMBL627731 0.76 CA2 (0.48) CA1CA2MAPK1SMN1; SMN2CA7
SCHEMBL2003827 0.74 CA2 (0.46) CA1CA2MAPK1SMN1; SMN2CA7
Phosphine SCHEMBL2053857 0.74 CA2 (0.46) CA1CA2MAPK1SMN1; SMN2CA7
SCHEMBL1618312 0.74 CA2 (0.46) CA1CA2MAPK1SMN1; SMN2CA7
Ammonia Solution, Strong SCHEMBL2053881 0.74 CA2 (0.46) CA1CA2MAPK1SMN1; SMN2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed
US-20170285482-A1 ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2017-10-05 US disclosed
US-20170184974-A1 PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-29 US disclosed
US-20170176862-A1 PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-22 US disclosed