Known targets — ChEMBL curated mechanism
rplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Stearic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 8/20 | 0.81 |
| ▸ | PPARG | P37231 | 7/20 | 0.81 |
| ▸ | PPARD | Q03181 | 7/20 | 0.81 |
| ▸ | PPARA | Q07869 | 7/20 | 0.81 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.81 |
| ▸ | TSHR | P16473 | 4/20 | 0.81 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.81 |
| ▸ | FABP4 | P15090 | 3/20 | 0.81 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.81 |
| ▸ | TLR2 | O60603 | 2/20 | 0.81 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.81 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.81 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.81 |
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.81 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.81 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.81 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.81 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.81 |
| ▸ | MEN1 | O00255 | 1/20 | 0.81 |
| ▸ | ESR1 | P03372 | 1/20 | 0.81 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dodecanoate SCHEMBL28204485 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Heptanoate SCHEMBL28247858 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Palmitic Acid SCHEMBL27773870 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Nonanoate SCHEMBL28354239 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Stearic Acid SCHEMBL7798142 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Nonanoate SCHEMBL28436990 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Octanoic Acid SCHEMBL30379279 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Decanoic Acid SCHEMBL30927823 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Octanoic Acid SCHEMBL9469136 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 | |
| Decanoic Acid SCHEMBL11415432 | 1.00 | GPR84 (0.81) | GPR84PPARGPPARDPPARAHDAC11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-20200041898-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2020-02-06 | — | — | US | disclosed |
| US-20190033713-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-01-31 | — | — | US | disclosed |
| US-20180356725-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2018-12-13 | — | — | US | disclosed |
| US-20180017864-A9 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2018-01-18 | — | — | US | disclosed |
| EP-3244262-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD | JSR Corporation (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-20170299962-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-10-19 | — | — | US | disclosed |
| EP-3229075-A1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-20170269476-A1 | PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-09-21 | — | — | US | disclosed |
| US-20170184960-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |