SCHEMBL1903594

SCHEMBL1903594

[CH2][C]([CH2])C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL78690 0.83
SCHEMBL5567728 0.77
SCHEMBL18807 0.77
SCHEMBL10707329 0.77
SCHEMBL4285665 0.77
SCHEMBL84341 0.77
SCHEMBL687041 0.77
SCHEMBL16861363 0.72
SCHEMBL1932485 0.72
SCHEMBL29380 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100048776-A1 Stabilizer compositions for halogen containing polymers CIBA CORP. 2010-02-25 US claimed
JP-2007510767-A 2007-04-26 JP claimed
US-20070027243-A1 Stabilizer compositions for halogen containing polymers CIBA SPECIALTY CHEMICALS CORP. 2007-02-01 US claimed
EP-1680463-A2 STABILIZER COMPOSITIONS FOR HALOGEN CONTAINING POLYMERS Ciba SC Holding AG (CH) 2006-07-19 EP claimed
WO-2005049715-A2 STABILIZER COMPOSITIONS FOR HALOGEN CONTAINING POLYMERS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-06-02 WO claimed
WO-2024094405-A1 DIENE COUPLED COPOLYMERS RICH IN ETHYLENE UNITS AND PREPARATION METHOD THEREOF COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) 2024-05-10 WO disclosed
US-8173731-B2 Stabilizer compositions for halogen containing polymers BASF SE (DE) 2012-05-08 US disclosed
US-20110112228-A1 STABILIZER COMPOSITIONS FOR HALOGEN CONTAINING POLYMERS BASF SE (DE) 2011-05-12 US disclosed
US-20100048776-A1 Stabilizer compositions for halogen containing polymers CIBA CORP. 2010-02-25 US disclosed
US-20090137774-A1 ADAMANTANE DERIVATIVE, RESIN COMPOSITION CONTAINING SAME, AND OPTOELECTRONIC COMPONENT USING SAME IDEMITSU KOSAN CO., LTD. (JP) 2009-05-28 US disclosed
EP-1930327-A1 ADAMANTANE DERIVATIVE, RESIN COMPOSITION CONTAINING SAME, AND OPTOELECTRONIC COMPONENT USING SAME IDEMITSU KOSAN CO., LTD. (JP) 2008-06-11 EP disclosed
US-20070027243-A1 Stabilizer compositions for halogen containing polymers CIBA SPECIALTY CHEMICALS CORP. 2007-02-01 US disclosed
EP-1680463-A2 STABILIZER COMPOSITIONS FOR HALOGEN CONTAINING POLYMERS Ciba SC Holding AG (CH) 2006-07-19 EP disclosed
WO-2005049715-A2 STABILIZER COMPOSITIONS FOR HALOGEN CONTAINING POLYMERS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-06-02 WO disclosed
US-6794530-B1 1,4-ADDITION OF MONOHYDRIC OR POLYHYDRIC ALCOHOLS TO ALPHA , BETA -UNSATURATED NITRILES BASF AKTIENGESELLSCHAFT (DE) 2004-09-21 US disclosed
EP-0934925-B1 Process for the preparation of beta-alkoxy nitriles BASF AG (DE) 2002-09-25 EP disclosed
US-6335143-B1 Resist composition containing specific cross-linking agent WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2002-01-01 US disclosed
EP-0934925-A1 Process for the preparation of beta-alkoxy nitriles BASF AKTIENGESELLSCHAFT (DE) 1999-08-11 EP disclosed
EP-0887706-A1 Resist composition containing specific cross-linking agent WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 1998-12-30 EP disclosed
US-4178378-A ANTIEPILEPTIC AGENT, TRANQUILIZER, AND ANTICONVULSANT CIBA-GEIGY CORPORATION (US) 1979-12-11 US disclosed