Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 12/20 | 0.46 |
| ▸ | CA2 | P00918 | 12/20 | 0.46 |
| ▸ | MMP1 | P03956 | 6/20 | 0.46 |
| ▸ | MMP2 | P08253 | 6/20 | 0.46 |
| ▸ | MMP9 | P14780 | 6/20 | 0.46 |
| ▸ | MMP8 | P22894 | 6/20 | 0.46 |
| ▸ | MMP13 | P45452 | 6/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.39 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.33 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.33 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.33 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19042201 | 0.94 | CA2 (0.53) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6260406 | 0.93 | CA2 (0.53) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL7881220 | 0.89 | CA2 (0.51) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL19042198 | 0.88 | CA2 (0.49) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL19042210 | 0.88 | EPHX1 (0.46) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL7884131 | 0.86 | CA2 (0.50) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL7887472 | 0.86 | CA2 (0.50) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1070262 | 0.82 | CA2 (0.56) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1851655 | 0.81 | CA2 (0.57) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL28375339 | 0.81 | CA2 (0.57) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20170184964-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184962-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184963-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |