SCHEMBL19050816

SCHEMBL19050816

c1ccc2c(c1)CCCOCCOCCOCCOc1ccccc1OCCOCCOCCOCCO2

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 3/20 0.65
▸ LMNA P02545 3/20 0.65
▸ CRHBP P24387 2/20 0.65
▸ CRHR2 Q13324 2/20 0.65
▸ HTT P42858 2/20 0.65
▸ ITGB2 P05107 1/20 0.54
▸ ICAM1 P05362 1/20 0.54
▸ ITGAL P20701 1/20 0.54
▸ GAA P10253 2/20 0.49
▸ KDM4E B2RXH2 2/20 0.42
▸ CTNNB1 P35222 3/20 0.41
▸ WNT3A P56704 3/20 0.41
▸ MAPT P10636 3/20 0.40
▸ BLM P54132 1/20 0.40
▸ TSHR P16473 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ MAOA P21397 1/20 0.39
▸ MAOB P27338 1/20 0.39
▸ ABCG2 Q9UNQ0 1/20 0.38
▸ OXTR P30559 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25951817 0.98 SMN1; SMN2 (0.61) SMN1; SMN2LMNACRHBPCRHR2HTT
Tetrahydrofuran SCHEMBL27935038 0.90 SMN1; SMN2 (0.50) SMN1; SMN2LMNACRHBPCRHR2HTT
SCHEMBL29356442 0.86 ITGB2 (0.52) SMN1; SMN2LMNACRHBPCRHR2HTT
SCHEMBL28007596 0.86 ITGB2 (0.52) SMN1; SMN2LMNACRHBPCRHR2HTT
SCHEMBL8447 0.86 ITGB2 (0.52) SMN1; SMN2LMNACRHBPCRHR2HTT
Fluoride SCHEMBL28202465 0.86 ITGB2 (0.52) SMN1; SMN2LMNACRHBPCRHR2HTT
SCHEMBL5313090 0.86 ITGB2 (0.52) SMN1; SMN2LMNACRHBPCRHR2HTT
Water SCHEMBL7527071 0.84 ITGB2 (0.50) SMN1; SMN2LMNACRHBPCRHR2HTT
Bromide SCHEMBL11373619 0.84 ITGB2 (0.50) SMN1; SMN2LMNACRHBPCRHR2HTT
SCHEMBL7650589 0.84 ITGB2 (0.50) SMN1; SMN2LMNACRHBPCRHR2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170184970-A1 PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-29 — — US disclosed
US-20170184970-A1 PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-29 — — US disclosed
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