⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL774754 | 0.78 | — | — | |
| SCHEMBL774753 | 0.78 | — | — | |
| SCHEMBL701842 | 0.75 | — | — | |
| SCHEMBL701841 | 0.75 | — | — | |
| SCHEMBL10457457 | 0.72 | ALOX15 (0.32) | — | |
| SCHEMBL239594 | 0.71 | NR1H2 (0.31) | — | |
| SCHEMBL8016612 | 0.71 | — | — | |
| SCHEMBL12482126 | 0.71 | — | — | |
| SCHEMBL5844557 | 0.70 | — | — | |
| SCHEMBL1766966 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210286267-A1 | COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-20210115221-A1 | COMPOSITION AND SUBSTRATE-TREATING METHOD | JSR CORPORATION (JP) | 2021-04-22 | — | — | US | disclosed |
| US-20200371436-A1 | STRUCTURE FOR A QUANTUM DOT BARRIER RIB AND PROCESS FOR PREPARING THE SAME | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2020-11-26 | — | — | US | disclosed |
| CN-111983891-A | Structure for quantum dot barrier rib and preparation method thereof | 罗门哈斯电子材料韩国有限公司 | 2020-11-24 | — | — | CN | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| US-20100190104-A1 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD | JSR CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20100021852-A1 | COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20100009292-A1 | RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION | JSR CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2133747-A1 | RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION | JSR Corporation (JP) | 2009-12-16 | — | — | EP | disclosed |
| EP-2131240-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR Corporation (JP) | 2009-12-09 | — | — | EP | disclosed |
| EP-2128706-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR Corporation (JP) | 2009-12-02 | — | — | EP | disclosed |
| EP-2078983-A1 | COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN | JSR Corporation (JP) | 2009-07-15 | — | — | EP | disclosed |
| EP-2003148-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2009-04-22 | — | — | EP | disclosed |
| EP-2003148-A2 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |
| EP-1757990-A1 | RESIN COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |