Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
| ▸ | EGFR | P00533 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | TUBB4A | P04350 | 2/20 | 0.46 |
| ▸ | TUBB | P07437 | 2/20 | 0.46 |
| ▸ | TUBA3C | P0DPH7 | 2/20 | 0.46 |
| ▸ | TUBA1B | P68363 | 2/20 | 0.46 |
| ▸ | TUBA4A | P68366 | 2/20 | 0.46 |
| ▸ | TUBB4B | P68371 | 2/20 | 0.46 |
| ▸ | TUBB3 | Q13509 | 2/20 | 0.46 |
| ▸ | TUBB2A | Q13885 | 2/20 | 0.46 |
| ▸ | TUBB8 | Q3ZCM7 | 2/20 | 0.46 |
| ▸ | TUBA3E | Q6PEY2 | 2/20 | 0.46 |
| ▸ | TUBA1A | Q71U36 | 2/20 | 0.46 |
| ▸ | TUBA1C | Q9BQE3 | 2/20 | 0.46 |
| ▸ | TUBB6 | Q9BUF5 | 2/20 | 0.46 |
| ▸ | TUBB2B | Q9BVA1 | 2/20 | 0.46 |
| ▸ | TUBB1 | Q9H4B7 | 2/20 | 0.46 |
| ▸ | CES2 | O00748 | 2/20 | 0.45 |
| ▸ | CES1 | P23141 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7745659 | 0.98 | EGFR (0.50) | LMNAEGFRTDP1TUBB4ATUBB | |
| SCHEMBL9746295 | 0.98 | EGFR (0.50) | LMNAEGFRTDP1TUBB4ATUBB | |
| SCHEMBL11407662 | 0.97 | EGFR (0.49) | LMNAEGFRTDP1TUBB4ATUBB | |
| SCHEMBL27617467 | 0.97 | EGFR (0.49) | LMNAEGFRTDP1TUBB4ATUBB | |
| SCHEMBL11819973 | 0.95 | KDM4E (0.48) | LMNAEGFRTDP1TUBB4ATUBB | |
| SCHEMBL11819983 | 0.95 | KDM4E (0.48) | LMNAEGFRTDP1TUBB4ATUBB | |
| SCHEMBL3869856 | 0.92 | PPARA (0.49) | LMNAEGFRTDP1HDAC3RECQL | |
| SCHEMBL3869859 | 0.92 | PPARA (0.49) | LMNAEGFRTDP1HDAC3RECQL | |
| SCHEMBL29008553 | 0.90 | PPARA (0.47) | LMNAEGFRTDP1HDAC3RECQL | |
| SCHEMBL11314706 | 0.90 | EGFR (0.48) | LMNAEGFRTDP1TUBB4ATUBB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0540965-A1 | Positive light sensitive composition and process for the formation of relief pattern | BASF Aktiengesellschaft (DE) | 1993-05-12 | — | — | EP | claimed |
| US-9217919-B2 | Photosensitive composition, pattern-forming method using the composition, and resin used in the composition | FUJIFILM CORPORATION (JP) | 2015-12-22 | — | — | US | disclosed |
| US-20150338743-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| US-8895222-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8852845-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin | FUJIFILM CORPORATION (JP) | 2014-10-07 | — | — | US | disclosed |
| US-8735048-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2014-05-27 | — | — | US | disclosed |
| EP-2529276-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM Corporation (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20120301817-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-11-29 | — | — | US | disclosed |
| WO-2011093520-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2011-08-04 | — | — | WO | disclosed |
| US-20110159433-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-06-30 | — | — | US | disclosed |
| CN-1189151-C | Cosmetic hair care preparations | BIOTEC ASA (NO) | 2005-02-16 | — | — | CN | disclosed |
| CN-1184954-C | Sun protection agents | BIOTEC ASA (NO) | 2005-01-19 | — | — | CN | disclosed |
| CN-1182834-C | Use of nano-scaled water-soluble beta- (1,3) glucans | \ | 2005-01-05 | — | — | CN | disclosed |
| CN-1158988-C | Cosmetic preparations | \ | 2004-07-28 | — | — | CN | disclosed |
| CN-1348356-A | Cosmetic and/or pharmaceutical preparation | BIOTEC ASA (NO) | 2002-05-08 | — | — | CN | disclosed |
| CN-1347302-A | Cosmetic preparations | BIOTEC ASA (NO) | 2002-05-01 | — | — | CN | disclosed |
| CN-1347307-A | Cosmetic preparation | BIOTEC ASA (NO) | 2002-05-01 | — | — | CN | disclosed |
| CN-1347303-A | Cosmetic hair care preparations | BIOTEC ASA (NO) | 2002-05-01 | — | — | CN | disclosed |
| CN-1347306-A | Sunscreen formulations | BIOTEC ASA (NO) | 2002-05-01 | — | — | CN | disclosed |
| EP-0540965-A1 | Positive light sensitive composition and process for the formation of relief pattern | BASF Aktiengesellschaft (DE) | 1993-05-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110159433-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION | SUN2, LCP1, PHYKPL | LMNA 1348/4885EGFR 4680/4885TDP1 818/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.