SCHEMBL19084312

SCHEMBL19084312

CCc1ccc(Oc2ccc(CC(C)(C)CC)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.44
RAB9A P51151 4/20 0.44
MAPT P10636 3/20 0.44
SMN1; SMN2 Q16637 4/20 0.38
S1PR1 P21453 2/20 0.37
S1PR3 Q99500 1/20 0.37
ALDH1A1 P00352 2/20 0.37
HPGD P15428 2/20 0.37
MAPK1 P28482 1/20 0.37
CYP2C19 P33261 1/20 0.37
ST14 Q9Y5Y6 1/20 0.35
LMNA P02545 1/20 0.35
KMT2A Q03164 1/20 0.35
LTA4H P09960 3/20 0.34
ESR1 P03372 1/20 0.34
ESR2 Q92731 1/20 0.34
RXRA P19793 1/20 0.34
RXRB P28702 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14350828 0.88 TP53 (0.42) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL11728604 0.85 MAPT (0.47) NPC1RAB9AMAPTSMN1; SMN2ALDH1A1
SCHEMBL19084259 0.85 NPC1 (0.44) NPC1RAB9AMAPTSMN1; SMN2S1PR1
SCHEMBL18686307 0.84 ESR1 (0.48) NPC1RAB9AMAPTSMN1; SMN2S1PR1
SCHEMBL14872069 0.82 BRS3 (0.41) ALDH1A1ESR1ESR2
SCHEMBL475215 0.81 SMN1; SMN2 (0.48) NPC1RAB9AMAPTSMN1; SMN2ALDH1A1
SCHEMBL8925998 0.81 SMN1; SMN2 (0.48) NPC1RAB9AMAPTSMN1; SMN2ALDH1A1
SCHEMBL12841723 0.80 IDO1 (0.48) MAPTSMN1; SMN2ALDH1A1MAPK1LTA4H
SCHEMBL20132758 0.79 TSHR (0.49) ALDH1A1LMNA
SCHEMBL13824185 0.78 NQO1 (0.56) NPC1RAB9AMAPTSMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10312074-B2 Method of producing layer structure, layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2019-06-04 US disclosed
WO-2017115978-A1 ORGANIC FILM COMPOSITION AND PATTERN FORMING METHOD 삼성에스디아이 주식회사 2017-07-06 WO disclosed