SCHEMBL18686307

SCHEMBL18686307

CCc1ccc(Oc2ccc(CC(C)(C)C)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.48
NPC1 O15118 4/20 0.43
RAB9A P51151 4/20 0.43
MAPT P10636 3/20 0.43
SMN1; SMN2 Q16637 4/20 0.40
ALDH1A1 P00352 2/20 0.39
HPGD P15428 2/20 0.39
MAPK1 P28482 1/20 0.39
RIPK1 Q13546 1/20 0.39
CYP2C19 P33261 1/20 0.39
THRA P10827 1/20 0.38
THRB P10828 1/20 0.38
ST14 Q9Y5Y6 1/20 0.38
LMNA P02545 1/20 0.37
KMT2A Q03164 1/20 0.37
LTA4H P09960 2/20 0.36
S1PR1 P21453 2/20 0.36
S1PR3 Q99500 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3480017 0.91 ESR1 (0.56) ESR1NPC1RAB9AMAPTSMN1; SMN2
SCHEMBL15706822 0.87 ESR1 (0.61) ESR1SMN1; SMN2ALDH1A1MAPK1THRA
SCHEMBL8925998 0.84 SMN1; SMN2 (0.48) NPC1RAB9AMAPTSMN1; SMN2ALDH1A1
SCHEMBL475215 0.84 SMN1; SMN2 (0.48) NPC1RAB9AMAPTSMN1; SMN2ALDH1A1
SCHEMBL19084259 0.84 NPC1 (0.44) NPC1RAB9AMAPTSMN1; SMN2ALDH1A1
SCHEMBL19084312 0.84 NPC1 (0.44) ESR1NPC1RAB9AMAPTSMN1; SMN2
SCHEMBL10603646 0.83 ALDH1A1 (0.59) ESR1NPC1RAB9AMAPTSMN1; SMN2
SCHEMBL22386734 0.83 LTA4H (0.50) ESR1SMN1; SMN2ALDH1A1MAPK1KMT2A
SCHEMBL17147385 0.83 TEAD4 (0.54) ESR1NPC1RAB9AMAPTSMN1; SMN2
SCHEMBL2600040 0.83 RIPK1 (0.56) ESR1RIPK1LTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4398036-A1 COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-10 EP disclosed
US-20230057401-A1 COATED UNDERLAYER FOR OVERCOATED PHOTORESIST U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-02-23 US disclosed
WO-2017115978-A1 ORGANIC FILM COMPOSITION AND PATTERN FORMING METHOD 삼성에스디아이 주식회사 2017-07-06 WO disclosed
US-20170088669-A1 PHOSPHORUS-CONTAINING POLYPHENYLENE OXIDE RESIN, ITS PREPARATION METHOD, METHOD FOR PREPARING PREPOLYMER OF PHOSPHORUS-CONTAINING POLYPHENYLENE OXIDE, RESIN COMPOSITION AND ITS APPLICATION Elite Material Co., Ltd. (TW) 2017-03-30 US disclosed