⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL144708 | 0.95 | — | — | |
| SCHEMBL19858976 | 0.95 | — | — | |
| Bromide SCHEMBL1502851 | 0.91 | — | — | |
| Water SCHEMBL2103284 | 0.91 | ALDH1A1 (0.42) | — | |
| Water SCHEMBL190436 | 0.91 | — | — | |
| Water SCHEMBL23036015 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL716874 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL7219353 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL20657271 | 0.91 | — | — | |
| Iodide SCHEMBL1502831 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7947637-B2 | Cleaning formulation for removing residues on surfaces | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2011-05-24 | — | — | US | claimed |
| EP-2041776-A2 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FujiFilm Electronic Materials USA, Inc. (US) | 2009-04-01 | — | — | EP | claimed |
| WO-2008005354-A2 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-01-10 | — | — | WO | claimed |
| US-20080004197-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2008-01-03 | — | — | US | claimed |
| CN-112585299-B | Chemical polishing liquid and surface treatment method using same | 三菱瓦斯化学株式会社 | 2023-09-22 | — | — | CN | disclosed |
| CN-112585299-A | Chemical polishing liquid and surface treatment method using same | 三菱瓦斯化学株式会社 | 2021-03-30 | — | — | CN | disclosed |
| EP-2295484-B1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2018-01-17 | — | — | EP | disclosed |
| EP-1959303-B1 | CLEANING SOLUTION FOR SEMICONDUCTOR DEVICE OR DISPLAY DEVICE, AND CLEANING METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| US-9290656-B2 | Polymerizable composition for polythiourethane optical material | MITSUI CHEMICALS, INC. (JP) | 2016-03-22 | — | — | US | disclosed |
| US-8658053-B2 | Etching composition for metal material and method for manufacturing semiconductor device by using same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-25 | — | — | US | disclosed |
| EP-2341091-B1 | POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, OPTICAL MATERIAL, AND METHOD FOR PREPARING THE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2013-12-04 | — | — | EP | disclosed |
| EP-1988109-B1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2013-05-29 | — | — | EP | disclosed |
| WO-2008005354-A2 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-01-10 | — | — | WO | disclosed |
| US-20080004197-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2008-01-03 | — | — | US | disclosed |
| WO-2006124201-A2 | SELECTIVE WET ETCHING OF OXIDES | SACHEM, INC. (US) | 2006-11-23 | — | — | WO | disclosed |
| US-20060040838-A1 | Cleaning liquid and cleaning method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-02-23 | — | — | US | disclosed |
| EP-1628336-A2 | Cleaning liquid and cleaning method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-02-22 | — | — | EP | disclosed |
| US-20040224866-A1 | Cleaning solution and cleaning process using the solution | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040188385-A1 | Etching agent composition for thin films having high permittivity and process for etching | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-09-30 | — | — | US | disclosed |
| US-3937806-A | WATER SOLUBLE FLUORIDE SALT AND INDIUM-MALIC ACID COMPLEX | THE PROCTER & GAMBLE COMPANY (US) | 1976-02-10 | — | — | US | disclosed |