SCHEMBL191803

SCHEMBL191803

[CH2]CC(F)(F)C(F)(F)C(F)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20679966 0.91
SCHEMBL1935830 0.88
SCHEMBL220932 0.88
SCHEMBL219673 0.88
SCHEMBL6946384 0.84 LMNA (0.32)
SCHEMBL6947462 0.84 LMNA (0.32)
SCHEMBL8417530 0.80
SCHEMBL179981 0.80
SCHEMBL12971185 0.79
SCHEMBL130629 0.78 LMNA (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 303 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1543074-B1 UV-CURABLE RESIN COMPOSITION FOR CLADDING OPTICAL FIBER SSCP CO LTD (KR) 2008-02-27 EP claimed
US-6410612-B1 ACRYLIC POLYMER BLEND KURARAY CO., LTD. (JP) 2002-06-25 US claimed
WO-2024127911-A1 OPTICAL LAMINATE AND IMAGE DISPLAY DEVICE 富士フイルム株式会社 2024-06-20 WO disclosed
CN-118192168-A Photosensitive resin composition 日产化学株式会社 2024-06-14 CN disclosed
CN-118043707-A Light absorbing anisotropic layer, optical film, viewing angle control system, and image display device 富士胶片株式会社 2024-05-14 CN disclosed
CN-115485049-B Defoaming agent and lubricating oil composition 引能仕株式会社 2024-04-26 CN disclosed
US-20240134187-A1 OPTICAL ELEMENT, IMAGE DISPLAY DEVICE, VIRTUAL REALITY DISPLAY DEVICE, ELECTRONIC VIEWFINDER, METHOD OF PRODUCING POLARIZER FUJIFILM CORPORATION (JP) 2024-04-25 US disclosed
CN-114456724-B Laminate body 富士胶片株式会社 2024-04-19 CN disclosed
US-11939462-B2 Functional film, polarizing plate, and display device FUJIFILM CORPORATION (JP) 2024-03-26 US disclosed
CN-110537146-B Photosensitive resin composition 日产化学株式会社 2024-03-15 CN disclosed
CN-110537147-B Photosensitive resin composition 日产化学株式会社 2024-03-12 CN disclosed
US-6007927-A FOR PREVENTING UNDESIRABLE DETERIORATION OF DIELECTRIC PROPERTIES AND SHORTENING OF DURABILITY INDUCED BY THE IMPURITY IONS PRESENT IN POWDERY BARIUM TITANATE SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1999-12-28 US disclosed
EP-0943606-A1 BENZENESULFONAMIDE DERIVATIVES AND DRUGS CONTAINING THE SAME HOKURIKU SEIYAKU CO., LTD. (JP) 1999-09-22 EP disclosed
EP-0940414-A2 Ocular lens material and process for producing the same KURARAY CO., LTD. (JP) 1999-09-08 EP disclosed
US-5861108-A IMPROVES HIGH SPEED RESPONSE PROPERTY AND TEMPERATURE DEPENDENCY OF THE RESPONSE TIME MITSUI CHEMICALS, INC. (JP) 1999-01-19 US disclosed
US-5777038-A FLUOROPOLYMER; ELECTROLUMINESCENCE SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1998-07-07 US disclosed
EP-0757032-A2 Naphthalene compound, and liquid crystal composition and liquid crystal element using the same MITSUI TOATSU CHEMICALS, INC. (JP) 1997-02-05 EP disclosed
EP-0113127-B1 PROCESS FOR PREPARING DIORGANOPOLYSILOXANE CONTAINING FLUOROALKYL GROUPS Wacker-Chemie GmbH (DE) 1990-03-07 EP disclosed
US-4577040-A Method for preparing diorganopolysiloxanes containing fluoroalkyl groups WACKER-CHEMIE GMBH (DE) 1986-03-18 US disclosed
EP-0113127-A2 Process for preparing diorganopolysiloxane containing fluoroalkyl groups Wacker-Chemie GmbH (DE) 1984-07-11 EP disclosed