⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9126471 | 0.97 | NPC1 (0.52) | — | |
| SCHEMBL9128911 | 0.97 | NPC1 (0.52) | — | |
| SCHEMBL6383373 | 0.97 | NPC1 (0.52) | — | |
| SCHEMBL6381815 | 0.97 | NPC1 (0.52) | — | |
| SCHEMBL9128685 | 0.97 | NPC1 (0.52) | — | |
| SCHEMBL190984 | 0.97 | NPC1 (0.52) | — | |
| SCHEMBL9129950 | 0.97 | NPC1 (0.52) | — | |
| SCHEMBL17885048 | 0.97 | NPC1 (0.52) | — | |
| Hydrochloric Acid SCHEMBL11432904 | 0.95 | NPC1 (0.50) | — | |
| SCHEMBL5210320 | 0.94 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 239 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | claimed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | claimed |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| WO-2025066075-A1 | ELECTROLYTE AND ALKALI METAL SECONDARY BATTERY CONTAINING SAME | 中国科学院苏州纳米技术与纳米仿生研究所 | 2025-04-03 | — | — | WO | claimed |
| CN-119695283-A | Electrolyte and alkali metal secondary battery containing same | 中国科学院苏州纳米技术与纳米仿生研究所 | 2025-03-25 | — | — | CN | claimed |
| CN-117013085-A | Weak solvation electrolyte and lithium-sulfur battery and lithium ion battery containing same | 中国科学院苏州纳米技术与纳米仿生研究所 | 2023-11-07 | — | — | CN | claimed |
| US-20230026579-A1 | METHOD FOR FORMING PHOTORESIST PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230026721-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230028244-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-11127974-B2 | Method of preparing sulfide-based solid electrolyte, sulfide-based solid electrolyte prepared therefrom, and solid secondary battery including the sulfide electrolyte | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-09-21 | — | — | US | claimed |
| US-20190348707-A1 | METHOD OF PREPARING SULFIDE-BASED SOLID ELECTROLYTE, SULFIDE-BASED SOLID ELECTROLYTE PREPARED THEREFROM, AND SOLID SECONDARY BATTERY INCLUDING THE SULFIDE ELECTROLYTE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-11-14 | — | — | US | claimed |
| CN-1454897-A | Method for producing phosphorousphenate | BAYER AG (DE) | 2003-11-12 | — | — | CN | claimed |
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| US-12624318-B2 | Cleaning agent composition and cleaning method | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-12 | — | — | US | disclosed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | disclosed |
| WO-1998007720-A1 | SUBSTITUTED 2-ARYLPYRIDINE AS HERBICIDE | BASF AKTIENGESELLSCHAFT (DE) | 1998-02-26 | — | — | WO | disclosed |
| WO-1998005649-A1 | SUBSTITUTED 3-PHENYL PYRAZOLES | BASF AKTIENGESELLSCHAFT (DE) | 1998-02-12 | — | — | WO | disclosed |
| US-3971825-A | (5,6) (10,11) BIS-METHYLENE, BRONCHODILATORS | SANKYO COMPANY LIMITED (JA) | 1976-07-27 | — | — | US | disclosed |