Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 1/20 | 0.52 |
| ▸ | NAAA | Q02083 | 3/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | ADH1A | P07327 | 2/20 | 0.34 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.34 |
| ▸ | SHBG | P04278 | 1/20 | 0.33 |
| ▸ | ADH1C | P00326 | 1/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9126471 | 1.00 | NPC1 (0.52) | NPC1NAAAEPHX1CYP1A2CYP2D6 | |
| SCHEMBL17885048 | 1.00 | NPC1 (0.52) | NPC1NAAAEPHX1CYP1A2CYP2D6 | |
| SCHEMBL9128911 | 1.00 | NPC1 (0.52) | NPC1NAAAEPHX1CYP1A2CYP2D6 | |
| SCHEMBL9128685 | 1.00 | NPC1 (0.52) | NPC1NAAAEPHX1CYP1A2CYP2D6 | |
| SCHEMBL6383373 | 1.00 | NPC1 (0.52) | NPC1NAAAEPHX1CYP1A2CYP2D6 | |
| SCHEMBL6381815 | 1.00 | NPC1 (0.52) | NPC1NAAAEPHX1CYP1A2CYP2D6 | |
| SCHEMBL9129950 | 1.00 | NPC1 (0.52) | NPC1NAAAEPHX1CYP1A2CYP2D6 | |
| Hydrochloric Acid SCHEMBL11432904 | 0.97 | NPC1 (0.50) | NPC1NAAAEPHX1CYP1A2CYP2D6 | |
| SCHEMBL191816 | 0.97 | — | — | |
| Methyl Alcohol SCHEMBL11197540 | 0.95 | NPC1 (0.48) | NPC1NAAAEPHX1CYP1A2CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 471 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | claimed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | claimed |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| US-20230026579-A1 | METHOD FOR FORMING PHOTORESIST PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230026721-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230028244-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-11127974-B2 | Method of preparing sulfide-based solid electrolyte, sulfide-based solid electrolyte prepared therefrom, and solid secondary battery including the sulfide electrolyte | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-09-21 | — | — | US | claimed |
| US-20190348707-A1 | METHOD OF PREPARING SULFIDE-BASED SOLID ELECTROLYTE, SULFIDE-BASED SOLID ELECTROLYTE PREPARED THEREFROM, AND SOLID SECONDARY BATTERY INCLUDING THE SULFIDE ELECTROLYTE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-11-14 | — | — | US | claimed |
| EP-0932082-A2 | Chemically amplified resist composition and method of creating a patterned resist using electron beam | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-07-28 | — | — | EP | claimed |
| EP-0918835-A1 | RINSE ADDED FABRIC SOFTENING COMPOSITIONS AND METHOD OF USE FOR THE DELIVERY OF FRAGRANCE PRECURSORS | THE PROCTER & GAMBLE COMPANY (US) | 1999-06-02 | — | — | EP | claimed |
| US-5830835-A | FABRIC SOFTENER, PERFUME ESTER MIXTURES | PROCTER & GAMBLE COMPANY (US) | 1998-11-03 | — | — | US | claimed |
| WO-1998027192-A2 | DRYER ADDED FABRIC SOFTENING COMPOSITIONS | THE PROCTER & GAMBLE COMPANY (US) | 1998-06-25 | — | — | WO | claimed |
| WO-1998027191-A1 | RINSE-ADDED AND DRYER-ADDED FABRIC SOFTENING COMPOSITIONS AND METHOD OF USE FOR THE DELIVERY OF ESTER FRAGRANCE DERIVATIVES | THE PROCTER & GAMBLE COMPANY (US) | 1998-06-25 | — | — | WO | claimed |
| WO-1998027190-A1 | DRYER-ACTIVATED FABRIC CONDITIONING AND ANTISTATIC COMPOSITIONS WITH IMPROVED PERFUME LONGEVITY | THE PROCTER & GAMBLE COMPANY (US) | 1998-06-25 | — | — | WO | claimed |
| WO-1998006803-A1 | RINSE ADDED FABRIC SOFTENING COMPOSITIONS AND METHOD OF USE FOR THE DELIVERY OF FRAGRANCE PRECURSORS | THE PROCTER & GAMBLE COMPANY (US) | 1998-02-19 | — | — | WO | claimed |
| US-5668102-A | SOLID OR LIQUID COMPOSITION CONTAINING CATIONIC QUATERNARY AMMONIUM FABRIC SOFTENING COMPOUND, NONIONIC OR ANIONIC ESTER OF NON-ALLYLIC ALCOHOL PERFUME | THE PROCTER & GAMBLE COMPANY (US) | 1997-09-16 | — | — | US | claimed |
| CN-1077985-A | Aqueous or the gluey bleaching composition of amide-containing peroxyacid bleach and perfume compound | PROCTER & GAMBLE (US) | 1993-11-03 | — | — | CN | claimed |
| US-4990688-A | Extraction from a mixture containing an aromatic sulfonic acid using an ether/phenol extractant | BASF AKTIENGESELLSCHAFT (DE) | 1991-02-05 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | TOP1, TOP2A, FTO | NPC1 3297/4885NAAA 2403/4885EPHX1 1030/4885 |
| US-12631966-B2 | Method for forming photoresist patterns | FTO, SOAT1, SOAT2 | NPC1 2108/4885NAAA 3406/4885EPHX1 1589/4885 |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | FGFR2, FGFR1, FDFT1 | NPC1 2156/4885NAAA 3006/4885EPHX1 2868/4885 |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | COL2A1, TOP1, TOP2A | NPC1 3186/4885NAAA 2660/4885EPHX1 2043/4885 |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | RER1, TOP1, RRS1 | NPC1 1460/4885NAAA 3744/4885EPHX1 1015/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.