SCHEMBL1918258

SCHEMBL1918258

O=C(c1ccc(O)c(O)c1)c1cc(O)c(O)c(O)c1O

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.61
KDM4E B2RXH2 3/20 0.50
PTGS2 P35354 2/20 0.50
CA12 O43570 2/20 0.50
CA1 P00915 2/20 0.50
CA2 P00918 2/20 0.50
GAA P10253 2/20 0.50
CA7 P43166 2/20 0.50
CA9 Q16790 2/20 0.50
CA14 Q9ULX7 2/20 0.50
MAPT P10636 2/20 0.50
POLB P06746 1/20 0.50
CA4 P22748 1/20 0.50
CA6 P23280 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
SIRT1 Q96EB6 1/20 0.47
HDAC6 Q9UBN7 1/20 0.46
RECQL P46063 2/20 0.44
DBH P09172 1/20 0.44
XDH P47989 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5703332 0.86 HDAC1 (0.75) HDAC1KDM4EPTGS2CA12CA1
SCHEMBL30103853 0.86 HDAC1 (0.75) HDAC1KDM4EPTGS2CA12CA1
SCHEMBL9639982 0.84 SIRT1 (0.47) HDAC1KDM4EPTGS2CA12CA1
SCHEMBL21845034 0.84 HDAC1 (0.47) HDAC1KDM4EPTGS2CA12CA1
SCHEMBL9638961 0.84 HDAC1 (0.70) HDAC1KDM4ECA12CA1CA2
SCHEMBL9298060 0.82 LIG1 (0.55) HDAC1KDM4ECA12CA1CA2
SCHEMBL19003399 0.82 CA12 (0.56) HDAC1KDM4EPTGS2CA12CA1
SCHEMBL18993048 0.81 CA12 (0.50) HDAC1KDM4EPTGS2CA12CA1
SCHEMBL10589365 0.79 FASN (0.62) HDAC1KDM4EPTGS2CA12CA1
SCHEMBL21935558 0.79 CA12 (0.58) HDAC1KDM4EPTGS2CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4863828-A Positive-working o-quinone diazide photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1989-09-05 US claimed
US-12044969-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
US-12044969-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
EP-3278795-B1 USES OF HYDROXYBENZOPHENONE IN PREPARATION OF ANTIVIRAL AND ANTITUMOR DRUGS GUANGZHOU JTREAT BIOSCI LTD (CN) 2023-08-30 EP disclosed
US-11639325-B2 Compositions of polyhydroxylated benzophenones and methods of treatment of neurodegenerative disorders MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2023-05-02 US disclosed
US-11639325-B2 Compositions of polyhydroxylated benzophenones and methods of treatment of neurodegenerative disorders MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2023-05-02 US disclosed
US-20220146939-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-11287741-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2022-03-29 US disclosed
US-11180438-B2 Compositions of polyhydroxylated benzophenones and methods of treatment of neurodegenerative disorders MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2021-11-23 US disclosed
US-20210311396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2021-10-07 US disclosed
US-5436098-A Multilayer element with quinone diazide, resin and aromatic hydroxy compound for relief images CIBA-GEIGY CORPORATION (US) 1995-07-25 US disclosed
US-5336583-A Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-08-09 US disclosed
US-5296330-A Resolution, amorphous CIBA-GEIGY CORP. (US) 1994-03-22 US disclosed
US-5294521-A Forming patterns on semiconductor wafers HOECHST CELANESE CORPORATION (US) 1994-03-15 US disclosed
EP-0530148-A1 Positive photo resist with increased dissolving power and reduced crystallisation tendency as well as new tetra(hydroxyphenyl)alkane OCG Microelectronic Materials Inc. (US) 1993-03-03 EP disclosed
EP-0510670-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1992-10-28 EP disclosed
EP-0510671-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1992-10-28 EP disclosed
EP-0227487-B1 POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-07-15 EP disclosed
US-5087548-A POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., INC. (JP) 1992-02-11 US disclosed
US-4683241-A ANTIINFLAMMATORY AGENTS ENZYME INHIBITORS G. D. SEARLE & CO. (US) 1987-07-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11639325-B2 Compositions of polyhydroxylated benzophenones and methods of treatment of neurodegenerative disorders HDAC1, HDAC10, HDAC6 HDAC1 1/4885KDM4E 418/4885PTGS2 3291/4885
US-11180438-B2 Compositions of polyhydroxylated benzophenones and methods of treatment of neurodegenerative disorders HDAC1, HDAC10, HDAC6 HDAC1 1/4885KDM4E 418/4885PTGS2 3291/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.