SCHEMBL191827

SCHEMBL191827

CCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL20357888 0.97
SCHEMBL14790661 0.87 LMNA (0.32)
SCHEMBL7622015 0.85
Ammonia Solution, Strong SCHEMBL28137534 0.85 LMNA (0.31)
SCHEMBL703375 0.84
SCHEMBL7530315 0.84
SCHEMBL6046671 0.84
SCHEMBL431224 0.83 LMNA (0.33)
SCHEMBL2398969 0.81 LMNA (0.36)
SCHEMBL191387 0.79 LMNA (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 558 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8344238-B2 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA LLC (US) 2013-01-01 US claimed
US-20110000539-A1 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA, INC. (US) 2011-01-06 US claimed
US-20100326495-A1 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA, INC. (US) 2010-12-30 US claimed
US-20070017567-A1 Self-cleaning protective coatings for use with photovoltaic cells BARNES, CHRISTOPHER 2007-01-25 US claimed
WO-2007012026-A1 SELF-CLEANING COATINGS SOLYNDRA, INC. (US) 2007-01-25 WO claimed
US-6465670-B2 SURFACE TREATMENT USING ORGANOSILICON COMPOUND, SOLVENT AND PHASE TRANSFER CATALYST THE GOODYEAR TIRE & RUBBER COMPANY 2002-10-15 US claimed
US-20020022085-A1 Preparation of surface modified silica GOODYEAR TIRE & RUBBER COMPANY, THE 2002-02-21 US claimed
WO-2024190380-A1 SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT MANUFACTURING METHOD, PATTERN FORMATION METHOD, AND SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT 東京応化工業株式会社 2024-09-19 WO disclosed
US-20240262964-A1 METHOD OF PRODUCING SILICONE POLYMER TORAY FINE CHEMICALS CO., LTD. (JP) 2024-08-08 US disclosed
EP-4361201-A1 METHOD FOR PRODUCING SILICONE POLYMER Toray Fine Chemicals Co., Ltd. (JP) 2024-05-01 EP disclosed
CN-117413005-A Process for producing siloxane polymer 东丽精细化工株式会社 2024-01-16 CN disclosed
CN-117069942-A Polysiloxane compound, composition for forming film, laminate, touch panel, and method for forming cured film 阪田油墨株式会社 2023-11-17 CN disclosed
CN-117075425-A Polysiloxane composition, composition for forming film, laminate, touch panel, and method for forming cured film 阪田油墨株式会社 2023-11-17 CN disclosed
EP-1045290-A2 Composition for resist underlayer film and method for producing the same JSR Corporation (JP) 2000-10-18 EP disclosed
EP-1008873-A1 Color filter and process for producing the same DAI NIPPON PRINTING CO., LTD. (JP) 2000-06-14 EP disclosed
US-6013372-A SELF-CLEANING, WEAR RESISTANT COATING TOTO, LTD. (JP) 2000-01-11 US disclosed
EP-0941839-A2 Radiant ray-sensitive lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1999-09-15 EP disclosed
EP-0932081-A1 PATTERN FORMING BODY, PATTERN FORMING METHOD, AND THEIR APPLICATIONS DAI NIPPON PRINTING CO., LTD. (JP) 1999-07-28 EP disclosed
EP-0921561-A2 Composition for film formation and film JSR Corporation (JP) 1999-06-09 EP disclosed
EP-0903389-A1 ANTIFOULING MEMBER AND ANTIFOULING COATING COMPOSITION TOTO LTD. (JP) 1999-03-24 EP disclosed