SCHEMBL191907

SCHEMBL191907

CC(C)O[Si](OC(C)C)(OC(C)C)C(F)(F)C(C)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14736441 0.77
SCHEMBL105707 0.76
SCHEMBL1054621 0.75
SCHEMBL192010 0.72
SCHEMBL20482196 0.72
SCHEMBL10827854 0.70
SCHEMBL191962 0.70
SCHEMBL5916753 0.70
SCHEMBL1470020 0.69
SCHEMBL1470753 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 253 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8344238-B2 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA LLC (US) 2013-01-01 US claimed
US-20110000539-A1 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA, INC. (US) 2011-01-06 US claimed
US-20100326495-A1 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA, INC. (US) 2010-12-30 US claimed
US-20070017567-A1 Self-cleaning protective coatings for use with photovoltaic cells BARNES, CHRISTOPHER 2007-01-25 US claimed
WO-2007012026-A1 SELF-CLEANING COATINGS SOLYNDRA, INC. (US) 2007-01-25 WO claimed
CN-115356873-B Resin composition, light-shielding film, method for producing light-shielding film, and substrate with barrier ribs 东丽株式会社 2025-04-25 CN disclosed
EP-3410468-B1 N-TYPE SEMICONDUCTOR ELEMENT, COMPLEMENTARY TYPE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND WIRELESS COMMUNICATION DEVICE IN WHICH THE SAME IS USED TORAY INDUSTRIES (JP) 2024-07-10 EP disclosed
EP-3382751-B1 FERROELECTRIC MEMORY ELEMENT, METHOD FOR PRODUCING SAME, MEMORY CELL USING FERROELECTRIC MEMORY ELEMENT, AND RADIO COMMUNICATION DEVICE USING FERROELECTRIC MEMORY ELEMENT TORAY INDUSTRIES (JP) 2023-09-13 EP disclosed
CN-109716491-B Method for manufacturing field effect transistor and method for manufacturing wireless communication device 东丽株式会社 2023-06-09 CN disclosed
CN-111295755-B Integrated circuit, method of manufacturing the same, and wireless communication device using the same 东丽株式会社 2023-05-12 CN disclosed
EP-3514822-B1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES (JP) 2023-04-26 EP disclosed
CN-108292630-B Ferroelectric memory element, method for manufacturing the same, memory cell using the same, and wireless communication device using the same 东丽株式会社 2023-04-25 CN disclosed
EP-1065533-A2 Color filter and process for producing the same DAI NIPPON PRINTING CO., LTD. (JP) 2001-01-03 EP disclosed
EP-1057622-A2 Lithographic printing plate precursor and method for producing the same FUJI PHOTO FILM CO., LTD. (JP) 2000-12-06 EP disclosed
EP-1038666-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2000-09-27 EP disclosed
EP-1008873-A1 Color filter and process for producing the same DAI NIPPON PRINTING CO., LTD. (JP) 2000-06-14 EP disclosed
US-6013372-A SELF-CLEANING, WEAR RESISTANT COATING TOTO, LTD. (JP) 2000-01-11 US disclosed
EP-0941839-A2 Radiant ray-sensitive lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1999-09-15 EP disclosed
EP-0932081-A1 PATTERN FORMING BODY, PATTERN FORMING METHOD, AND THEIR APPLICATIONS DAI NIPPON PRINTING CO., LTD. (JP) 1999-07-28 EP disclosed
EP-0903389-A1 ANTIFOULING MEMBER AND ANTIFOULING COATING COMPOSITION TOTO LTD. (JP) 1999-03-24 EP disclosed