SCHEMBL192076

SCHEMBL192076

C=C(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL190669 0.79 THRB (0.33)
SCHEMBL1275959 0.76 THRB (0.43)
SCHEMBL31470129 0.74 THRB (0.48)
SCHEMBL31470114 0.74 THRB (0.48)
SCHEMBL6348702 0.72
SCHEMBL160347 0.72
SCHEMBL1999095 0.72
SCHEMBL2338215 0.70
SCHEMBL20591244 0.70
SCHEMBL776535 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1225 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12410368-B2 Etching gas composition, substrate processing apparatus, and pattern forming method using the etching gas composition SEMES CO., LTD. (KR) 2025-09-09 US claimed
WO-2025078958-A1 FLUOROPOLYMER BIOPROCESS BAG DAIKIN AMERICA, INC. (US) 2025-04-17 WO claimed
US-12183591-B2 Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-12-31 US claimed
US-20240392192-A1 ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME SEMES CO., LTD. (KR) 2024-11-28 US claimed
US-20240392191-A1 ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SEMES CO., LTD. (KR) 2024-11-28 US claimed
CN-118126230-A Ethylene-tetrafluoroethylene tetrapolymer and preparation method thereof 浙江巨化技术中心有限公司 2024-06-04 CN claimed
US-20240018075-A1 METHOD FOR STORING FLUOROBUTENE RESONAC CORPORATION (JP) 2024-01-18 US claimed
US-11851602-B2 Epoxide and fluorinated epoxide stabilizers for fluoroolefins THE CHEMOURS COMPANY FC, LLC (US) 2023-12-26 US claimed
US-20230407175-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION SEMES CO LTD (KR) 2023-12-21 US claimed
US-20230407177-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION SEMES CO., LTD. (KR) 2023-12-21 US claimed
EP-1578806-A1 POLYMERIZATION PROCESSES ExxonMobil Chemical Patents Inc. (US) 2005-09-28 EP claimed
EP-1572752-A1 POLYMERIZATION PROCESSES ExxonMobil Chemical Patents Inc. (US) 2005-09-14 EP claimed
EP-1572763-A2 POLYMERS WITH NEW SEQUENCE DISTRIBUTIONS ExxonMobil Chemical Patents Inc. (US) 2005-09-14 EP claimed
EP-1572766-A1 POLYMERS WITH NEW SEQUENCE DISTRIBUTIONS ExxonMobil Chemical Patents Inc. (US) 2005-09-14 EP claimed
US-20050107536-A1 Polymers with new sequence distributions EXXONMOBIL CHEMICAL PATENTS INC. 2005-05-19 US claimed
US-20050101751-A1 Halogenated polymers with new sequence distributions EXXONMOBIL CHEMICAL PATENTS INC. 2005-05-12 US claimed
WO-2004058836-A1 POLYMERS WITH NEW SEQUENCE DISTRIBUTIONS EXXONMOBIL CHEMICAL PATENTS INC. (US) 2004-07-15 WO claimed
WO-2004058828-A1 POLYMERIZATION PROCESSES EXXONMOBIL CHEMICAL PATENTS INC. (US) 2004-07-15 WO claimed
WO-2004058827-A1 POLYMERIZATION PROCESSES EXXONMOBIL CHEMICAL PATENTS INC. (US) 2004-07-15 WO claimed
WO-2004058825-A2 POLYMERS WITH NEW SEQUENCE DISTRIBUTIONS EXXONMOBIL CHEMICAL PATENTS, INC. (US) 2004-07-15 WO claimed