SCHEMBL19214002

SCHEMBL19214002

CC(C)c1cc2c(s1)-c1sc(C(C)C)cc1C2C

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ PTGS1 P23219 1/20 0.30
▸ PTGS2 P35354 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19213984 0.88 PTGS1 (0.31) PTGS1PTGS2
SCHEMBL22355813 0.70 PTGS1 (0.40) PTGS1PTGS2
SCHEMBL19214003 0.70 — —
SCHEMBL15276770 0.69 MEN1 (0.32) —
SCHEMBL16440507 0.65 PTGS1 (0.31) PTGS1PTGS2
SCHEMBL16687361 0.65 PRKDC (0.33) PTGS1PTGS2
SCHEMBL2720129 0.64 MAPK1 (0.31) —
SCHEMBL12566026 0.64 PRKDC (0.33) —
SCHEMBL13363415 0.64 CHRNB2 (0.30) —
SCHEMBL12546496 0.64 PTGS1 (0.43) PTGS1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9932441-B2 Organic semiconductor element, manufacturing method thereof, compound, composition for forming organic semiconductor film, organic semiconductor film, and manufacturing method thereof FUJIFILM CORPORATION (JP) 2018-04-03 — — US disclosed
US-20170229655-A1 ORGANIC SEMICONDUCTOR ELEMENT, MANUFACTURING METHOD THEREOF, COMPOUND, COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, AND ORGANIC SEMICONDUCTOR FILM FUJIFILM CORPORATION (JP) 2017-08-10 — — US disclosed
US-20170226280-A1 ORGANIC SEMICONDUCTOR ELEMENT, MANUFACTURING METHOD THEREOF, COMPOUND, COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, AND ORGANIC SEMICONDUCTOR FILM FUJIFILM CORPORATION (JP) 2017-08-10 — — US disclosed
US-20170226279-A1 ORGANIC SEMICONDUCTOR ELEMENT, MANUFACTURING METHOD THEREOF, COMPOUND, COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2017-08-10 — — US disclosed
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