SCHEMBL19214040

SCHEMBL19214040

Cc1ccc(N2C(=O)N(c3ccc(C)cc3)C2=O)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 1.00
F2 P00734 1/20 1.00
CTSG P08311 1/20 1.00
CMA1 P23946 1/20 1.00
CTRC Q99895 1/20 1.00
MGLL Q99685 1/20 0.65
LMNA P02545 1/20 0.59
ALDH1A1 P00352 2/20 0.53
RAB9A P51151 2/20 0.53
NPC1 O15118 1/20 0.53
TSHR P16473 1/20 0.53
CASP1 P29466 1/20 0.53
CASP7 P55210 1/20 0.53
HSD17B10 Q99714 1/20 0.53
MAPT P10636 1/20 0.50
MAPK1 P28482 1/20 0.48
CACNA1B Q00975 1/20 0.48
APBA1 Q02410 1/20 0.48
POLB P06746 1/20 0.47
ADORA2A P29274 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5447636 0.84 ELANE (0.71) ELANEF2CTSGCMA1CTRC
SCHEMBL11604846 0.82 F2 (0.68) ELANEF2CTSGCMA1CTRC
SCHEMBL3174970 0.80 ELANE (0.65) ELANEF2CTSGCMA1CTRC
SCHEMBL19708009 0.80 ELANE (0.65) ELANEF2CTSGCMA1CTRC
SCHEMBL140025 0.79 MGLL (1.00) ELANEF2CTSGCMA1CTRC
SCHEMBL15849078 0.79 ELANE (0.65) ELANEF2CTSGCMA1CTRC
SCHEMBL19227946 0.79 F2 (0.63) ELANEF2CTSGCMA1CTRC
SCHEMBL10262918 0.77 MAPT (0.66) ELANEF2CTSGCMA1CTRC
SCHEMBL13226476 0.77 ELANE (0.64) ELANEF2CTSGCMA1CTRC
SCHEMBL12605364 0.77 TP53 (0.65) ELANEF2CTSGCMA1CTRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10201911-B2 Continuous process for forming a unitary mat BASF SE (DE) 2019-02-12 US disclosed
US-20170225355-A1 Continuous Process For Forming A Unitary Mat BASF CORPORATION 2017-08-10 US disclosed
US-20170225355-A1 Continuous Process For Forming A Unitary Mat BASF CORPORATION 2017-08-10 US disclosed