SCHEMBL19214196

SCHEMBL19214196

CCCCCCCCCCC(CCCCCCCCCC)CCN1C(=O)c2cc3c(cc2=C1c1ccc(Br)s1)C(=O)N(CCC(CCCCCCCCCC)CCCCCCCCCC)C=3c1ccc(Br)s1

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CES1 P23141 2/20 0.30
CDC25A P30304 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19214176 0.83 HSF1 (0.31)
SCHEMBL18788501 0.82 PTGS1 (0.36) CES1CDC25A
SCHEMBL17963729 0.82 PTGS1 (0.36) CES1CDC25A
SCHEMBL17982720 0.82 PTGS1 (0.33) CES1CDC25A
SCHEMBL30343309 0.82 PTGS1 (0.36) CES1CDC25A
SCHEMBL26965420 0.82 PTGS1 (0.36) CES1CDC25A
SCHEMBL16914334 0.82 PTGS1 (0.36) CES1CDC25A
SCHEMBL25220106 0.80 PTGS1 (0.35) CES1CDC25A
SCHEMBL19217430 0.78
SCHEMBL19217454 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9932441-B2 Organic semiconductor element, manufacturing method thereof, compound, composition for forming organic semiconductor film, organic semiconductor film, and manufacturing method thereof FUJIFILM CORPORATION (JP) 2018-04-03 US disclosed
US-20170226279-A1 ORGANIC SEMICONDUCTOR ELEMENT, MANUFACTURING METHOD THEREOF, COMPOUND, COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2017-08-10 US disclosed
US-20170226279-A1 ORGANIC SEMICONDUCTOR ELEMENT, MANUFACTURING METHOD THEREOF, COMPOUND, COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2017-08-10 US disclosed