SCHEMBL19217430

SCHEMBL19217430

CCCCCCCCCCC(CCCCCCCCCC)CCN1C(=O)c2cc3c(cc2=C1c1ccc(-c2ccc(-c4ccc(-c5ccc(C(C)(C)C)s5)s4)s2)s1)C(=O)N(CCC(CCCCCCCCCC)CCCCCCCCCC)C=3C(C)(C)CCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19217454 0.94
SCHEMBL19217511 0.90
SCHEMBL19214196 0.78 CES1 (0.30)
SCHEMBL19214176 0.78 HSF1 (0.31)
SCHEMBL19217503 0.78
SCHEMBL19217525 0.77
SCHEMBL19217522 0.76
SCHEMBL19217515 0.76
SCHEMBL20828979 0.74 KDM4E (0.30)
SCHEMBL20829127 0.74 KDM4E (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170226279-A1 ORGANIC SEMICONDUCTOR ELEMENT, MANUFACTURING METHOD THEREOF, COMPOUND, COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2017-08-10 US disclosed