⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL28299346 | 0.88 | ALDH1A1 (0.35) | — | |
| Formic Acid SCHEMBL28035762 | 0.86 | — | — | |
| Dimethylamine SCHEMBL28116452 | 0.84 | — | — | |
| Formic Acid SCHEMBL28249844 | 0.82 | — | — | |
| Methylhydrazine SCHEMBL7902871 | 0.82 | — | — | |
| Methylhydrazine SCHEMBL28653031 | 0.79 | — | — | |
| Formic Acid SCHEMBL11153346 | 0.78 | — | — | |
| Formic Acid SCHEMBL11073136 | 0.78 | — | — | |
| Formic Acid SCHEMBL9472719 | 0.78 | — | — | |
| Formic Acid SCHEMBL139759 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119143651-A | Method for preparing pyrrole and furan compounds from N-acetylglucosamine | 南京工业大学 | 2024-12-17 | — | — | CN | claimed |
| CN-119031802-A | Perovskite film preparation method and perovskite battery | 深圳黑晶光电技术有限公司 | 2024-11-26 | — | — | CN | claimed |
| CN-115724808-B | Olefin epoxidation method | 中国石油化工股份有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-117942766-A | Antioxidant pollution-resistant dual-function reverse osmosis membrane and preparation method thereof | 道尔顿中科环境(深圳)有限公司 | 2024-04-30 | — | — | CN | claimed |
| CN-117715892-A | Quaternary ammonium cation substituted compounds for the treatment of bacterial infections | 豪夫迈·罗氏有限公司 | 2024-03-15 | — | — | CN | claimed |
| CN-117400710-A | Novel composite material whole car and battery package connection structure | 江苏亨睿碳纤维科技有限公司 | 2024-01-16 | — | — | CN | claimed |
| CN-114171779-B | High-safety lithium ion battery and preparation method thereof | 中国电子科技集团公司第十八研究所 | 2023-08-08 | — | — | CN | claimed |
| CN-112316642-B | Dust removal system | 广东亚镭机电工程有限公司 | 2023-06-02 | — | — | CN | claimed |
| CN-112056669-B | Intelligent manufacturing process of clothing | 浙江壹禾服饰有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-112009036-B | Breathable and water-absorbent fabric and manufacturing process thereof | 浙江爵帅制衣有限公司 | 2022-08-26 | — | — | CN | claimed |
| CN-111269246-A | Dibromo compound containing thiophene and thiazole [4,5, b ] thiazole structure and preparation method thereof | 江汉大学 | 2020-06-12 | — | — | CN | claimed |
| CN-111058298-A | Production device and production process of double-layer wet-process bass | 安徽宝博合成革有限公司 | 2020-04-24 | — | — | CN | claimed |
| CN-110721594-A | Hydrophilic polyvinylidene fluoride composite porous membrane and preparation method thereof | 江苏美能膜材料科技有限公司 | 2020-01-24 | — | — | CN | claimed |
| CN-107709320-A | A kind of pyrido nitrogen heterocyclic and its production and use | 中国科学院上海药物研究所 | 2018-02-16 | — | — | CN | claimed |
| EP-2922851-B1 | AMINOPYRIMIDINE COMPOUNDS AS INHIBITORS OF T790M CONTAINING EGFR MUTANTS | GENENTECH INC (US) | 2017-07-26 | — | — | EP | claimed |
| CN-105061139-A | Synthetic method for methallyl alcohol | SHANDONG LECRON ENERGY SAVING NEW MATERIAL CO LTD | 2015-11-18 | — | — | CN | claimed |
| EP-0680078-B1 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-03-12 | — | — | EP | claimed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | claimed |
| US-5630904-A | Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 1997-05-20 | — | — | US | claimed |
| EP-0680078-A2 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-11-02 | — | — | EP | claimed |