SCHEMBL19335752

SCHEMBL19335752

CCC(I)C(=O)OCC12CC3CC(CC(CO)(C3)C1)C2

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.41
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
GAA P10253 1/20 0.38
THRB P10828 1/20 0.37
LMNA P02545 1/20 0.33
SCN9A Q15858 1/20 0.33
EPHX2 P34913 1/20 0.33
MAPT P10636 1/20 0.33
ATM Q13315 1/20 0.33
PKM P14618 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
USP2 O75604 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18845374 0.89 ALDH1A1 (0.37) ALDH1A1MEN1KMT2AL3MBTL1GAA
SCHEMBL18845040 0.86 ALDH1A1 (0.41) ALDH1A1MEN1KMT2AL3MBTL1GAA
SCHEMBL9924477 0.84 ALDH1A1 (0.42) ALDH1A1MEN1KMT2AL3MBTL1GAA
SCHEMBL18845379 0.83 ALDH1A1 (0.33) ALDH1A1MEN1KMT2AL3MBTL1THRB
SCHEMBL18845043 0.82 ALDH1A1 (0.35) ALDH1A1MEN1KMT2AL3MBTL1GAA
SCHEMBL12705124 0.80 ALDH1A1 (0.40) ALDH1A1MEN1KMT2AL3MBTL1GAA
SCHEMBL11991796 0.80 ALDH1A1 (0.42) ALDH1A1MEN1KMT2AL3MBTL1GAA
SCHEMBL20811067 0.78 ALDH1A1 (0.33) ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL12705125 0.77 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AL3MBTL1GAA
SCHEMBL14791584 0.76 PRSS1 (0.41) ALDH1A1MEN1KMT2AL3MBTL1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3035121-B1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2019-03-13 EP disclosed
US-9790166-B2 Polymer, monomer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-17 US disclosed
US-9758609-B2 Monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed