SCHEMBL1936063

SCHEMBL1936063

[CH2]CCCCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8519812 1.00
SCHEMBL26679565 1.00
SCHEMBL6651495 1.00
SCHEMBL11247650 1.00
SCHEMBL6656916 1.00
SCHEMBL11248877 1.00
SCHEMBL1934061 1.00
SCHEMBL5606043 0.98 LMNA (0.31)
SCHEMBL6651597 0.98 LMNA (0.31)
SCHEMBL1935946 0.98

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230151049-A1 Compounds Useful in HIV Therapy VIIV HEALTHCARE COMPANY (US) 2023-05-18 US claimed
US-20230151049-A1 Compounds Useful in HIV Therapy VIIV HEALTHCARE COMPANY (US) 2023-05-18 US disclosed
US-10175576-B2 Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2019-01-08 US disclosed
US-20160211143-A1 CURABLE COMPOSITION FOR OPTICAL IMPRINTING AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2016-07-21 US disclosed
US-20150185606-A1 CURABLE COMPOSITION FOR PHOTO IMPRINTS, METHOD FOR FORMING PATTERN, FINE PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-07-02 US disclosed
CN-102131654-A Combination dry erase board/projection screen 3M INNOVATIVE PROPERTIES CO 2011-07-20 CN disclosed
US-20110143330-A1 COMBINATION DRY ERASE BOARD/PROJECTION SCREEN 3M INNOVATIVE PROPERTIES COMPANY 2011-06-16 US disclosed
EP-2332391-A2 COMBINATION DRY ERASE BOARD/PROJECTION SCREEN 3M Innovative Properties Company (US) 2011-06-15 EP disclosed
WO-2010022342-A2 COMBINATION DRY ERASE BOARD/PROJECTION SCREEN 3M INNOVATIVE PROPERTIES COMPANY (US) 2010-02-25 WO disclosed
EP-1120399-B1 Naphthalene compound, and liquid crystal composition and liquid crystal element using the same MITSUI CHEMICALS INC (JP) 2004-06-09 EP disclosed
EP-1120400-B1 Naphtahlene compound, and liquid crystal composition and liquid crystal element using the same MITSUI CHEMICALS INC (JP) 2003-09-24 EP disclosed
EP-0757032-B1 Naphthalene compound, and liquid crystal composition and liquid crystal element using the same MITSUI CHEMICALS INC (JP) 2001-12-12 EP disclosed
EP-0751133-B1 Pyrimidine compound, and liquid crystal composition and liquid crystal element using the same MITSUI CHEMICALS INC (JP) 2001-09-12 EP disclosed
EP-1120400-A1 Naphtahlene compound, and liquid crystal composition and liquid crystal element using the same Mitsui Chemicals, Inc. (JP) 2001-08-01 EP disclosed
EP-1120399-A1 Naphthalene compound, and liquid crystal composition and liquid crystal element using the same Mitsui Chemicals, Inc. (JP) 2001-08-01 EP disclosed
US-5861108-A IMPROVES HIGH SPEED RESPONSE PROPERTY AND TEMPERATURE DEPENDENCY OF THE RESPONSE TIME MITSUI CHEMICALS, INC. (JP) 1999-01-19 US disclosed
US-5770108-A HIGH SPEED RESPONSE, MOLECULAR ORIENTATION, HIGH CONTRAST, RECEPTIVITY MITSUI TOATSU CHEMICALS, INC. (JP) 1998-06-23 US disclosed
EP-0757032-A2 Naphthalene compound, and liquid crystal composition and liquid crystal element using the same MITSUI TOATSU CHEMICALS, INC. (JP) 1997-02-05 EP disclosed
EP-0751133-A1 Pyrimidine compound, and liquid crystal composition and liquid crystal element using the same MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1997-01-02 EP disclosed