SCHEMBL19360787

SCHEMBL19360787

CCC(C)(C)C(=O)OC12CC3CC(CC(OCCC(C)(O)C(F)(F)F)(C3)C1)C2

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
DPP8 Q6V1X1 2/20 0.30
DPP9 Q86TI2 2/20 0.30
DPP4 P27487 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13046103 0.85 DPP8 (0.36) DPP8DPP9DPP4
SCHEMBL13219546 0.84 DPP8 (0.31) DPP8DPP9
SCHEMBL10224666 0.83 DPP8 (0.33) DPP8DPP9DPP4
SCHEMBL17738435 0.83 DPP8 (0.31) DPP8DPP9
SCHEMBL13563636 0.82 ALDH1A1 (0.35) DPP8DPP9DPP4
SCHEMBL2607762 0.82 DPP8 (0.32) DPP8DPP9DPP4
SCHEMBL12014321 0.82 DPP8 (0.33) DPP8DPP9DPP4
SCHEMBL14183864 0.81 CYP17A1 (0.34) DPP8DPP9DPP4
SCHEMBL2607818 0.81 CYP17A1 (0.34) DPP8DPP9DPP4
SCHEMBL19360782 0.81 DPP8 (0.32) DPP8DPP9DPP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11656548-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-05-23 US disclosed
US-20170269476-A1 PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-09-21 US disclosed