⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18400960 | 0.84 | — | — | |
| SCHEMBL19335325 | 0.77 | — | — | |
| SCHEMBL18400959 | 0.77 | ALDH1A1 (0.32) | — | |
| SCHEMBL4810875 | 0.73 | — | — | |
| SCHEMBL22317681 | 0.73 | ALDH1A1 (0.41) | — | |
| SCHEMBL14533207 | 0.73 | ALDH1A1 (0.41) | — | |
| SCHEMBL13999640 | 0.72 | — | — | |
| SCHEMBL18893324 | 0.72 | — | — | |
| SCHEMBL1687742 | 0.71 | — | — | |
| SCHEMBL3408379 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10012903-B2 | Resist composition and pattern forming process | SHIN-ESTU CHEMICAL CO., LTD. (JP) | 2018-07-03 | — | — | US | disclosed |
| US-20170277037-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-28 | — | — | US | disclosed |