SCHEMBL19400658

SCHEMBL19400658

CC(C)(C)C(=O)Oc1ccc2cc(O)ccc2c1

nearest known ligand 0.59

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ELANE P08246 10/20 0.59
KMT2A Q03164 5/20 0.51
CA2 P00918 4/20 0.51
MEN1 O00255 4/20 0.51
CASP3 P42574 2/20 0.51
SENP8 Q96LD8 2/20 0.51
SENP7 Q9BQF6 2/20 0.51
SENP6 Q9GZR1 2/20 0.51
NPC1 O15118 1/20 0.51
ESR1 P03372 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Betanaphthol SCHEMBL16236542 0.93 KMT2A (0.57) ELANEKMT2AMEN1CASP3SENP8
SCHEMBL30339521 0.85 ELANE (0.58) ELANEKMT2ACA2MEN1NPC1
SCHEMBL12618375 0.85 ELANE (0.58) ELANEKMT2ACA2MEN1NPC1
SCHEMBL10457691 0.84 ELANE (0.56) ELANEKMT2ACA2ESR1
SCHEMBL18791204 0.83 CYP3A4 (0.67) ELANEESR1
SCHEMBL119862 0.83 ESR1 (0.48) ELANEKMT2AMEN1CASP3SENP8
SCHEMBL11991238 0.83 KMT2A (0.47) ELANEKMT2AMEN1CASP3SENP8
SCHEMBL8403640 0.82 ELANE (0.81) ELANEKMT2AMEN1
SCHEMBL7120446 0.81 CYP3A4 (0.63) KMT2AMEN1CASP3SENP8SENP7
SCHEMBL10457815 0.81 ELANE (0.53) ELANEKMT2ACA2MEN1CASP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10012903-B2 Resist composition and pattern forming process SHIN-ESTU CHEMICAL CO., LTD. (JP) 2018-07-03 US disclosed
US-20170277037-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-28 US disclosed