Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | PGR | P06401 | 1/20 | 0.31 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.31 |
| ▸ | AR | P10275 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15942901 | 0.86 | CYP17A1 (0.43) | CYP17A1CYP19A1CYP3A4HIF1APGR | |
| SCHEMBL19418032 | 0.83 | CYP17A1 (0.34) | CYP17A1CYP19A1 | |
| SCHEMBL19418029 | 0.78 | CYP17A1 (0.32) | CYP17A1CYP19A1 | |
| SCHEMBL22643370 | 0.77 | CYP19A1 (0.38) | CYP17A1CYP19A1 | |
| SCHEMBL685244 | 0.76 | CYP17A1 (0.41) | CYP17A1CYP19A1 | |
| SCHEMBL13971210 | 0.76 | CYP17A1 (0.41) | CYP17A1CYP19A1 | |
| SCHEMBL686143 | 0.76 | CYP17A1 (0.41) | CYP17A1CYP19A1 | |
| SCHEMBL47422 | 0.75 | CYP17A1 (0.41) | CYP17A1CYP19A1 | |
| SCHEMBL18903144 | 0.74 | CYP17A1 (0.33) | CYP17A1CYP19A1 | |
| SCHEMBL12017740 | 0.74 | CYP17A1 (0.40) | CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2060600-B1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD (JP) | 2017-12-27 | — | — | EP | disclosed |
| EP-2093213-B1 | Positive resist composition and method of forming a resist pattern using the same | TOKYO OHKA KOGYO CO LTD (JP) | 2017-10-04 | — | — | EP | disclosed |