SCHEMBL22643370

SCHEMBL22643370

CCC(C)(C)C(=O)OC1(C)C2CC3CC(C2)C1C3

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 4/20 0.38
CYP17A1 P05093 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL47397 0.85 CYP19A1 (0.48) CYP19A1CYP17A1
SCHEMBL14258823 0.80 CYP19A1 (0.39) CYP19A1CYP17A1
SCHEMBL14479570 0.78 CYP19A1 (0.38) CYP19A1CYP17A1
SCHEMBL19418031 0.77 CYP17A1 (0.34) CYP19A1CYP17A1
SCHEMBL18903144 0.77 CYP17A1 (0.33) CYP19A1CYP17A1
SCHEMBL19753642 0.76
SCHEMBL107115 0.76 CYP17A1 (0.36) CYP19A1CYP17A1
SCHEMBL107999 0.76 CYP17A1 (0.43) CYP19A1CYP17A1
SCHEMBL12345992 0.75 CYP17A1 (0.35) CYP19A1CYP17A1
SCHEMBL2607742 0.75 EPHX2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023067915-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR株式会社 2023-04-27 WO disclosed
EP-2414896-B1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORP (JP) 2020-11-11 EP disclosed